Inventor · disambiguated record
Alan E. Rosenbluth
Also filed as: ROSENBLUTH ALAN · ROSENBLUTH ALAN E · ROSENBLUTH ALAN EDWARD
106 granted patents·3 pending applications·2,897 citations·filing 1979–2020
99Inventor score
Top patents by PatentIndex Score
109 records- 0198US10872188B2Tool to provide integrated circuit masks with accurate dimensional compensation of patternsIBM·Filed 2019·Granted Dec 22, 2020·9 cites·15 claims
- 0298US7512927B2Printability verification by progressive modeling accuracyIBM·Filed 2006·Granted Mar 31, 2009·77 cites·32 claims
- 0398US6563566B2System and method for printing semiconductor patterns using an optimized illumination and reticleIBM·Filed 2001·Granted May 13, 2003·186 cites·43 claims
- 0498US6377233B2Micromechanical display and fabrication methodIBM·Filed 2001·Granted Apr 23, 2002·203 cites·9 claims
- 0597US10210295B2Tool to provide integrated circuit masks with accurate dimensional compensation of patternsIBM·Filed 2017·Granted Feb 19, 2019·15 cites·8 claims
- 0696US10915686B2Tool to provide integrated circuit masks with accurate dimensional compensation of patternsIBM·Filed 2019·Granted Feb 9, 2021·4 cites·16 claims
- 0796US6869739B1Integrated lithographic print and detection model for optical CDIBM·Filed 2003·Granted Mar 22, 2005·95 cites·21 claims
- 0896US5921650AHigh efficiency field-sequential color projector using two SLMsIBM·Filed 1998·Granted Jul 13, 1999·176 cites·36 claims
- 0996US5680588AMethod and system for optimizing illumination in an optical photolithography projection imaging systemIBM·Filed 1995·Granted Oct 21, 1997·198 cites·25 claims
- 1095US7363611B2Printing a mask with maximum possible process window through adjustment of the source distributionIBM·Filed 2006·Granted Apr 22, 2008·19 cites·8 claims
- 1195US7079223B2Fast model-based optical proximity correctionIBM·Filed 2004·Granted Jul 18, 2006·86 cites·24 claims
- 1295US7010776B2Extending the range of lithographic simulation integralsIBM·Filed 2003·Granted Mar 7, 2006·73 cites·30 claims
- 1395US6665033B2Method for forming alignment layer by ion beam surface modificationIBM·Filed 2000·Granted Dec 16, 2003·63 cites·6 claims
- 1495US6323834B1Micromechanical displays and fabrication methodIBM·Filed 1998·Granted Nov 27, 2001·137 cites·22 claims
- 1595US4902899ALithographic process having improved image qualityIBM·Filed 1987·Granted Feb 20, 1990·153 cites·6 claims
- 1694US9651856B2Source, target and mask optimization by incorporating contour based assessments and integration over process variationsIBM·Filed 2015·Granted May 16, 2017·5 cites·20 claims
- 1794US8372565B2Method for optimizing source and mask to control line width roughness and image log slopeIBM·Filed 2010·Granted Feb 12, 2013·12 cites·41 claims
- 1894US8266556B2Fracturing continuous photolithography masksLIU YING·Filed 2010·Granted Sep 11, 2012·11 cites·19 claims
- 1994US7057709B2Printing a mask with maximum possible process window through adjustment of the source distributionIBM·Filed 2003·Granted Jun 6, 2006·45 cites·7 claims
- 2094US5517340AHigh performance projection display with two light valvesIBM·Filed 1995·Granted May 14, 1996·152 cites·20 claims
- 2192US8078995B2Efficient isotropic modeling approach to incorporate electromagnetic effects into lithographic process simulationsTIRAPU AZPIROZ JAIONE·Filed 2009·Granted Dec 13, 2011·19 cites·42 claims
- 2291US9310674B2Mask that provides improved focus control using orthogonal edgesIBM·Filed 2014·Granted Apr 12, 2016·7 cites·40 claims
- 2391US8271910B2EMF correction model calibration using asymmetry factor data obtained from aerial images or a patterned layerTIRAPU-AZPIROZ JAIONE·Filed 2010·Granted Sep 18, 2012·9 cites·13 claims
- 2491US5452090ACCD based confocal filtering for improved accuracy in x-ray proximity alignmentIBM·Filed 1994·Granted Sep 19, 1995·69 cites·11 claims
- 2588US8682634B2Analyzing a patterning process using a model of yieldBAGHERI SAEED·Filed 2012·Granted Mar 25, 2014·5 cites·20 claims
- 2688US8495528B2Method for generating a plurality of optimized wavefronts for a multiple exposure lithographic processBAGHERI SAEED·Filed 2010·Granted Jul 23, 2013·6 cites·20 claims
- 2788US7774737B2Performance in model-based OPC engine utilizing efficient polygon pinning methodIBM·Filed 2007·Granted Aug 10, 2010·7 cites·30 claims
- 2887US8954898B2Source-mask optimization for a lithography processIBM·Filed 2013·Granted Feb 10, 2015·5 cites·16 claims
- 2986US7975244B2Methodology and system for determining numerical errors in pixel-based imaging simulation in designing lithographic masksIBM·Filed 2008·Granted Jul 5, 2011·8 cites·33 claims
- 3086US5777789AEfficient optical system for a high resolution projection display employing reflection light valvesIBM·Filed 1997·Granted Jul 7, 1998·96 cites·11 claims
- 3186US5621486AEfficient optical system for a high resolution projection display employing reflection light valvesIBM·Filed 1995·Granted Apr 15, 1997·99 cites·16 claims
- 3285US8351037B2Method to match exposure tools using a programmable illuminatorIBM·Filed 2010·Granted Jan 8, 2013·5 cites·24 claims
- 3385US7712071B2Printing a mask with maximum possible process window through adjustment of the source distributionIBM·Filed 2007·Granted May 4, 2010·5 cites·4 claims
- 3485US6082861AOptical system and method for high contrast projection displayIBM·Filed 1998·Granted Jul 4, 2000·68 cites·16 claims
- 3584US8028254B2Determining manufacturability of lithographic mask using continuous derivatives characterizing the manufacturability on a continuous scaleIBM·Filed 2008·Granted Sep 27, 2011·7 cites·18 claims
- 3684US6332693B1Apparatus and method for intensifying illumination brightness by time-superposing multiple pulsed light sourcesIBM·Filed 2000·Granted Dec 25, 2001·26 cites·29 claims
- 3784US5159172AOptical projection systemIBM·Filed 1990·Granted Oct 27, 1992·65 cites·26 claims
- 3883US10394984B2Tool to provide integrated circuit masks with accurate dimensional compensation of patternsIBM·Filed 2016·Granted Aug 27, 2019·2 cites·17 claims
- 3983US8108802B2Method for forming arbitrary lithographic wavefronts using standard mask technologyROSENBLUTH ALAN E·Filed 2009·Granted Jan 31, 2012·10 cites·18 claims
- 4083US7736841B2Reflective film interface to restore transverse magnetic wave contrast in lithographic processingIBM·Filed 2008·Granted Jun 15, 2010·4 cites·10 claims
- 4183US7343582B2Optical proximity correction using progressively smoothed mask shapesIBM·Filed 2005·Granted Mar 11, 2008·13 cites·21 claims
- 4283US7269817B2Lithographic process window optimization under complex constraints on edge placementIBM·Filed 2004·Granted Sep 11, 2007·23 cites·6 claims
- 4383US6052231ABeam dividing elements permitting projection of an image with high contrastIBM·Filed 1999·Granted Apr 18, 2000·60 cites·14 claims
- 4482US9395622B2Synthesizing low mask error enhancement factor lithography solutionsGLOBALFOUNDRIES INC·Filed 2014·Granted Jul 19, 2016·3 cites·17 claims
- 4581US7470504B2Reflective film interface to restore transverse magnetic wave contrast in lithographic processingIBM·Filed 2005·Granted Dec 30, 2008·4 cites·1 claims
- 4681US4896952AThin film beamsplitter optical element for use in an image-forming lens systemIBM·Filed 1988·Granted Jan 30, 1990·44 cites·9 claims
- 4779US9250535B2Source, target and mask optimization by incorporating countour based assessments and integration over process variationsIBM·Filed 2013·Granted Feb 2, 2016·2 cites·20 claims
- 4879US8910089B1Printing process calibration and correctionIBM·Filed 2013·Granted Dec 9, 2014·7 cites·17 claims
- 4979US8125618B2Reflective film interface to restore transverse magnetic wave contrast in lithographic processingLAI KAFAI·Filed 2008·Granted Feb 28, 2012·4 cites·1 claims
- 5078US8539390B2Determining manufacturability of lithographic mask based on manufacturing shape penalty of aspect ratio of edge that takes into account pair of connected edges of the edgeINOUE TADANOBU·Filed 2011·Granted Sep 17, 2013·3 cites·20 claims
Showing the top 50 of 109 patent records by PatentIndex Score.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →