Inventor · disambiguated record
Hans C. Pfeiffer
Also filed as: PFEIFFER HANS · PFEIFFER HANS C · PFEIFFER HANS CHRISTIAN
25 granted patents·879 citations·filing 1974–2002
97Inventor score
Top patents by PatentIndex Score
25 records- 0196US4213053AElectron beam system with character projection capabilityIBM·Filed 1978·Granted Jul 15, 1980·56 cites·5 claims
- 0295US4243866AMethod and apparatus for forming a variable size electron beamIBM·Filed 1979·Granted Jan 6, 1981·63 cites·28 claims
- 0394US4376249AVariable axis electron beam projection systemIBM·Filed 1980·Granted Mar 8, 1983·54 cites·14 claims
- 0493US4818885AElectron beam writing method and system using large range deflection in combination with a continuously moving tableIBM·Filed 1987·Granted Apr 4, 1989·79 cites·7 claims
- 0593US4417203ASystem for contactless electrical property testing of multi-layer ceramicsIBM·Filed 1981·Granted Nov 22, 1983·67 cites·28 claims
- 0691US3984687AShielded magnetic lens and deflection yoke structure for electron beam columnIBM·Filed 1975·Granted Oct 5, 1976·36 cites·11 claims
- 0790US6180947B1Multi-element deflection aberration correction for electron beam lithographyNIKON CORP·Filed 1998·Granted Jan 30, 2001·62 cites·19 claims
- 0890US4544846AVariable axis immersion lens electron beam projection systemIBM·Filed 1983·Granted Oct 1, 1985·37 cites·17 claims
- 0990US4415851ASystem for contactless testing of multi-layer ceramicsIBM·Filed 1981·Granted Nov 15, 1983·55 cites·17 claims
- 1089US5466904AElectron beam lithography systemIBM·Filed 1993·Granted Nov 14, 1995·54 cites·23 claims
- 1184US5633507AElectron beam lithography system with low brightnessIBM·Filed 1995·Granted May 27, 1997·44 cites·18 claims
- 1283US6069684AElectron beam projection lithography system (EBPS)IBM·Filed 1998·Granted May 30, 2000·42 cites·18 claims
- 1381US5545902AElectron beam lithography systemIBM·Filed 1995·Granted Aug 13, 1996·34 cites·37 claims
- 1480US4423305AMethod and apparatus for controlling alignment of an electron beam of a variable shapeIBM·Filed 1981·Granted Dec 27, 1983·20 cites·18 claims
- 1579US4251728ACompensated magnetic deflection coil for electron beam lithography systemIBM·Filed 1979·Granted Feb 17, 1981·17 cites·15 claims
- 1678US4843330AElectron beam contactless testing system with grid bias switchingIBM·Filed 1986·Granted Jun 27, 1989·35 cites·13 claims
- 1776US4859856ATelecentric sub-field deflection with vailIBM·Filed 1988·Granted Aug 22, 1989·21 cites·7 claims
- 1875US4945246ATri-deflection electron beam systemIBM·Filed 1989·Granted Jul 31, 1990·21 cites·13 claims
- 1968US4000440AMethod and apparatus for controlling brightness and alignment of a beam of charged particlesIBM·Filed 1974·Granted Dec 28, 1976·12 cites·19 claims
- 2065US6710361B2Multi-beam hybrid solenoid lens electron beam systemIBM·Filed 2002·Granted Mar 23, 2004·6 cites·13 claims
- 2164US5674413AScattering reticle for electron beam systemsIBM·Filed 1995·Granted Oct 7, 1997·23 cites·6 claims
- 2261US6130432AParticle beam system with dynamic focusingIBM·Filed 1999·Granted Oct 10, 2000·15 cites·17 claims
- 2353US5935739AManufacturing method for membrane lithography mask with mask fieldsIBM·Filed 1998·Granted Aug 10, 1999·19 cites·11 claims
- 2450US6633040B1Solenoid electron beam lenses with high demagnification and low aberrationsIBM·Filed 2002·Granted Oct 14, 2003·1 cites·13 claims
- 2545US6296976B1Compensation of within-subfield linewidth variation in e-beam projection lithographyNIKON CORP·Filed 1999·Granted Oct 2, 2001·6 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →