Inventor · disambiguated record
Yuriko Matsuura
Also filed as: MATSUURA YURIKO
8 granted patents·2 pending applications·2 citations·filing 2009–2023
73Inventor score
Files withMERCK PATENT GMBH4WANG XIAOWEI3AZ ELECTRONIC MAT (LUXEMBOURG) S A R L1AZ ELECTRONIC MAT LUXEMBOURG SARL1KANG WENBING1
Top patents by PatentIndex Score
10 records- 0168US10451974B2Rinse composition, a method for forming resist patterns and a method for making semiconductor devicesAZ ELECTRONIC MAT LUXEMBOURG SARL·Filed 2017·Granted Oct 22, 2019·1 cites·11 claims
- 0267US11914296B2Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coatingMERCK PATENT GMBH·Filed 2023·Granted Feb 27, 2024·0 cites·20 claims
- 0360US9298095B2Rinse solution for lithography and pattern formation method employing the sameWANG XIAOWEI·Filed 2012·Granted Mar 29, 2016·1 cites·17 claims
- 0451US11609498B2Ethynyl derived composite, a composition comprising thereof, a method for manufacturing a coating by it, and a method for manufacturing a device comprising the coatingMERCK PATENT GMBH·Filed 2018·Granted Mar 21, 2023·0 cites·20 claims
- 0544US11366389B2Allyloxy derivative, resist underlayer forming composition using the same, and method of manufacturing resist underlayer and semiconductor device using the sameMERCK PATENT GMBH·Filed 2018·Granted Jun 21, 2022·0 cites·20 claims
- 0644US2011165523A1Substrate treating solution and method employing the same for treating a resist substrateWANG XIAOWEI·Filed 2009·Application pending·0 cites
- 0742US8618002B2Resist pattern formating methodKANG WENBING·Filed 2009·Granted Dec 31, 2013·0 cites·14 claims
- 0841US11450805B2Compound, semiconductor material, and methods for manufacturing coating and semiconductor using the sameMERCK PATENT GMBH·Filed 2017·Granted Sep 20, 2022·0 cites·14 claims
- 0938US2013164694A1Rinse solution for lithography and pattern formation method employing the sameWANG XIAOWEI·Filed 2011·Application pending·0 cites
- 1037US9494867B2Rinsing liquid for lithography and pattern forming method using sameAZ ELECTRONIC MAT (LUXEMBOURG) S A R L·Filed 2014·Granted Nov 15, 2016·0 cites·16 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →