Inventor · disambiguated record
Sanket Sant
Also filed as: SANT SANKET · SANT SANKET P
12 granted patents·5 pending applications·421 citations·filing 2005–2020
92Inventor score
Top patents by PatentIndex Score
17 records- 0198US7560390B2Multiple spacer steps for pitch multiplicationMICRON TECHNOLOGY INC·Filed 2005·Granted Jul 14, 2009·68 cites·23 claims
- 0294US8784676B2Waferless auto conditioningGUHA JOYDEEP·Filed 2012·Granted Jul 22, 2014·278 cites·18 claims
- 0393US9117766B2Method for positioning spacers in pitch multiplicationMICRON TECHNOLOGY INC·Filed 2014·Granted Aug 25, 2015·9 cites·18 claims
- 0493US8865598B2Method for positioning spacers in pitch multiplicationMICRON TECHNOLOGY INC·Filed 2013·Granted Oct 21, 2014·9 cites·19 claims
- 0592US8003542B2Multiple spacer steps for pitch multiplicationMICRON TECHNOLOGY INC·Filed 2009·Granted Aug 23, 2011·12 cites·16 claims
- 0692US7972471B2Inductively coupled dual zone processing chamber with single planar antennaLAM RES CORP·Filed 2007·Granted Jul 5, 2011·17 cites·14 claims
- 0790US8598041B2Method for positioning spacers in pitch multiplicationSANT SANKET·Filed 2012·Granted Dec 3, 2013·8 cites·22 claims
- 0887US8173550B2Method for positioning spacers for pitch multiplicationSANT SANKET·Filed 2011·Granted May 8, 2012·5 cites·20 claims
- 0980US8232538B2Method and apparatus of halogen removal using optimal ozone and UV exposureSANT SANKET·Filed 2009·Granted Jul 31, 2012·9 cites·20 claims
- 1071US8525139B2Method and apparatus of halogen removalSINGH HARMEET·Filed 2010·Granted Sep 3, 2013·3 cites·20 claims
- 1170US9029267B2Controlling temperature of a faraday shieldLAM RES CORP·Filed 2013·Granted May 12, 2015·2 cites·20 claims
- 1259US8119532B2Inductively coupled dual zone processing chamber with single planar antennaSANT SANKET P·Filed 2011·Granted Feb 21, 2012·1 cites·18 claims
- 1357US2021110998A9Plasma etching device with plasma etch resistant coatingLAM RES CORP·Filed 2020·Application pending·0 cites
- 1449US2006165873A1Plasma detection and associated systems and methods for controlling microfeature workpiece deposition processesMICRON TECHNOLOGY INC·Filed 2005·Application pending·0 cites
- 1547US2016358749A1Plasma etching device with plasma etch resistant coatingLAM RES CORP·Filed 2016·Application pending·0 cites
- 1636US2014034242A1Edge ring assembly for plasma processing chamber and method of manufacture thereofSANT SANKET P·Filed 2012·Application pending·0 cites
- 1735US2016365261A1Plasma etching device with doped quartz surfacesLAM RES CORP·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →