Inventor · disambiguated record
John G. Hartley
Also filed as: HARTLEY JOHN · HARTLEY JOHN G · HARTLEY JOHN GEORGE
26 granted patents·334 citations·filing 1995–2020
96Inventor score
Top patents by PatentIndex Score
26 records- 0196US11139138B2Multiple electron beams irradiation apparatusNUFLARE TECHNOLOGY INC·Filed 2020·Granted Oct 5, 2021·5 cites·10 claims
- 0291US11145485B2Multiple electron beams irradiation apparatusNUFLARE TECHNOLOGY INC·Filed 2019·Granted Oct 12, 2021·6 cites·7 claims
- 0385US10734190B2Multiple electron beam irradiation apparatus, multiple electron beam inspection apparatus and multiple electron beam irradiation methodNUFLARE TECHNOLOGY INC·Filed 2019·Granted Aug 4, 2020·3 cites·10 claims
- 0485US5773836AMethod for correcting placement errors in a lithography systemIBM·Filed 1996·Granted Jun 30, 1998·49 cites·11 claims
- 0583US6614035B2Multi-beam shaped beam lithography systemIBM·Filed 2002·Granted Sep 2, 2003·19 cites·8 claims
- 0683US5825039ADigitally stepped deflection raster system and method of use thereofIBM·Filed 1996·Granted Oct 20, 1998·42 cites·22 claims
- 0779US5621216AHardware/software implementation for multipass E-beam mask writingIBM·Filed 1996·Granted Apr 15, 1997·39 cites·7 claims
- 0872US5798528ACorrection of pattern dependent position errors in electron beam lithographyIBM·Filed 1997·Granted Aug 25, 1998·28 cites·21 claims
- 0970US6291819B1Method of calibrating an electron beam system for lithographyIBM·Filed 1999·Granted Sep 18, 2001·21 cites·8 claims
- 1065US6822248B2Spatial phase locking with shaped electron beam lithographyIBM·Filed 2001·Granted Nov 23, 2004·13 cites·20 claims
- 1162US6437347B1Target locking system for electron beam lithographyIBM·Filed 1999·Granted Aug 20, 2002·15 cites·21 claims
- 1260US6486953B1Accurate real-time landing angle and telecentricity measurement in lithographic systemsIBM·Filed 2000·Granted Nov 26, 2002·4 cites·18 claims
- 1360US5916716AEmulation methodology for critical dimension control in E-Beam lithographyIBM·Filed 1997·Granted Jun 29, 1999·16 cites·15 claims
- 1457US9177817B2Methods for fabricating three-dimensional nano-scale structures and devicesHARTLEY JOHN G·Filed 2012·Granted Nov 3, 2015·1 cites·38 claims
- 1554US5570405ARegistration and alignment technique for X-ray mask fabricationIBM·Filed 1995·Granted Oct 29, 1996·18 cites·15 claims
- 1653US10937623B2Deflector for multiple electron beams and multiple beam image acquiring apparatusNUFLARE TECHNOLOGY INC·Filed 2019·Granted Mar 2, 2021·0 cites·10 claims
- 1753US6177680B1Correction of pattern-dependent errors in a particle beam lithography systemIBM·Filed 1998·Granted Jan 23, 2001·25 cites·12 claims
- 1851US11615938B2High-resolution multiple beam sourceNUFLARE TECHNOLOGY INC·Filed 2019·Granted Mar 28, 2023·0 cites·18 claims
- 1951US5917932ASystem and method for evaluating image placement on pre-distorted masksIBM·Filed 1997·Granted Jun 29, 1999·13 cites·14 claims
- 2049US11621144B2Electron optical system and multi-beam image acquiring apparatusNUFLARE TECHNOLOGY INC·Filed 2019·Granted Apr 4, 2023·0 cites·7 claims
- 2148US6090528ASpot-to-spot stitching in electron beam lithography utilizing square aperture with serrated edgeFiled 1999·Granted Jul 18, 2000·7 cites·20 claims
- 2247US6818906B1Electron beam position reference systemIBM·Filed 2003·Granted Nov 16, 2004·1 cites·6 claims
- 2342US6091072APiece-wise processing of very large semiconductor designsIBM·Filed 1997·Granted Jul 18, 2000·6 cites·12 claims
- 2435US6369396B1Calibration target for electron beamsIBM·Filed 1999·Granted Apr 9, 2002·2 cites·19 claims
- 2534US8729492B2Methods, devices, and systems for manipulating charged particle streamsRUAN JUNRU·Filed 2011·Granted May 20, 2014·0 cites·17 claims
- 2630US5838013AMethod for monitoring resist charging in a charged particle systemIBM·Filed 1996·Granted Nov 17, 1998·1 cites·26 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →