Inventor · disambiguated record
Tomohisa Shimazu
Also filed as: SHIMAZU TOMOHISA
20 granted patents·1,840 citations·filing 1995–2006
97Inventor score
Files withTOKYO ELECTRON LTD20
Top patents by PatentIndex Score
20 records- 0199US5718574AHeat treatment apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Feb 17, 1998·581 cites·23 claims
- 0298US6235121B1Vertical thermal treatment apparatusTOKYO ELECTRON LTD·Filed 2000·Granted May 22, 2001·339 cites·11 claims
- 0397US5775889AHeat treatment process for preventing slips in semiconductor wafersTOKYO ELECTRON LTD·Filed 1995·Granted Jul 7, 1998·395 cites·3 claims
- 0492USD411176SWafer boat for use in a semiconductor wafer heat processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jun 22, 1999·44 cites·1 claims
- 0590US6062853AHeat-treating boat for semiconductor wafersTOKYO ELECTRON LTD·Filed 1997·Granted May 16, 2000·111 cites·10 claims
- 0690USD404371SWafer boat for use in a semiconductor wafer heat processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jan 19, 1999·37 cites·1 claims
- 0789USD409158SWafer boat for use in a semiconductor wafer heat processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted May 4, 1999·36 cites·1 claims
- 0888USD407696SInner tube for use in a semiconductor wafer heat processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Apr 6, 1999·35 cites·1 claims
- 0987USD405062SProcessing tube for use in a semiconductor wafer heat processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Feb 2, 1999·32 cites·1 claims
- 1086USD405431STube for use in a semiconductor wafer heat processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Feb 9, 1999·30 cites·1 claims
- 1181USD404368SOuter tube for use in a semiconductor wafer heat processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jan 19, 1999·24 cites·1 claims
- 1275US7479619B2Thermal processing unitTOKYO ELECTRON LTD·Filed 2006·Granted Jan 20, 2009·4 cites·9 claims
- 1375US6030457ASubstrate processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Feb 29, 2000·42 cites·4 claims
- 1473US6283175B1Enveloping device and vertical heat-treating apparatus for semiconductor process systemTOKYO ELECTRON LTD·Filed 2000·Granted Sep 4, 2001·14 cites·7 claims
- 1570US6142773AEnveloping device and vertical heat-treating apparatus for semiconductor process systemTOKYO ELECTRON LTD·Filed 1999·Granted Nov 7, 2000·34 cites·13 claims
- 1669US5709543AVertical heat treatment apparatusTOKYO ELECTRON LTD·Filed 1996·Granted Jan 20, 1998·36 cites·18 claims
- 1768USD423026SQuartz coverTOKYO ELECTRON LTD·Filed 1998·Granted Apr 18, 2000·14 cites·1 claims
- 1858US6031205AThermal treatment apparatus with thermal protection members intercepting thermal radiation at or above a predetermined angleTOKYO ELECTRON LTD·Filed 1996·Granted Feb 29, 2000·22 cites·33 claims
- 1954USD404375SHeat retaining tube base for use in a semiconductor wafer head processing apparatusTOKYO ELECTRON LTD·Filed 1998·Granted Jan 19, 1999·8 cites·1 claims
- 2050US7144823B2Thermal treatment apparatusTOKYO ELECTRON LTD·Filed 2002·Granted Dec 5, 2006·2 cites·19 claims
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