Inventor · disambiguated record
Anthony D. Lisi
Also filed as: LISI ANTHONY D · LISI ANTHONY DAVID
11 granted patents·5 pending applications·516 citations·filing 2007–2014
91Inventor score
Top patents by PatentIndex Score
16 records- 0198US8241992B2Method for air gap interconnect integration using photo-patternable low k materialCLEVENGER LAWRENCE A·Filed 2010·Granted Aug 14, 2012·422 cites·18 claims
- 0292US8642252B2Methods for fabrication of an air gap-containing interconnect structureCLEVENGER LAWRENCE A·Filed 2010·Granted Feb 4, 2014·13 cites·17 claims
- 0392US7943480B2Sub-lithographic dimensioned air gap formation and related structureIBM·Filed 2008·Granted May 17, 2011·18 cites·13 claims
- 0490US7470616B1Damascene wiring fabrication methods incorporating dielectric cap etch process with hard mask retentionIBM·Filed 2008·Granted Dec 30, 2008·29 cites·1 claims
- 0589US7939446B1Process for reversing tone of patterns on integerated circuit and structural process for nanoscale fabricationIBM·Filed 2009·Granted May 10, 2011·16 cites·42 claims
- 0685US8952539B2Methods for fabrication of an air gap-containing interconnect structureIBM·Filed 2014·Granted Feb 10, 2015·5 cites·15 claims
- 0777US8896120B2Structures and methods for air gap integrationCLEVENGER LAWRENCE A·Filed 2010·Granted Nov 25, 2014·4 cites·17 claims
- 0873US8399180B2Three dimensional integration with through silicon vias having multiple diametersFAROOQ MUKTA G·Filed 2010·Granted Mar 19, 2013·3 cites·11 claims
- 0973US8183694B2Reversing tone of patterns on integrated circuit and nanoscale fabricationCLEVENGER LAWRENCE A·Filed 2011·Granted May 22, 2012·3 cites·42 claims
- 1061US8058176B2Methods of patterning insulating layers using etching techniques that compensate for etch rate variationsPARK WAN-JAE·Filed 2007·Granted Nov 15, 2011·3 cites·4 claims
- 1155US2011020753A1Method for reversing tone of patterns on integrated circuit and patterning sub-lithography trenchesIBM·Filed 2009·Application pending·0 cites
- 1251US8629561B2Air gap-containing interconnect structure having photo-patternable low k materialCLEVENGER LAWRENCE A·Filed 2012·Granted Jan 14, 2014·0 cites·20 claims
- 1350US2013022930A1Method for Reversing Tone of Patterns on Integrated Circuit and Patterning Sub-Lithography TrenchesIBM·Filed 2012·Application pending·0 cites
- 1448US2009283912A1Damascene wiring fabrication methods incorporating dielectric cap etch process with hard mask retentionAKINMADE-YUSUFF HAKEEM B S·Filed 2008·Application pending·0 cites
- 1542US2014357080A1Method for preferential shrink and bias control in contact shrink etchTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1636US2011168671A1Process control using signal representative of a throttle valve positionIBM·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →