Inventor · disambiguated record
Wei-Zen Chou
Also filed as: CHOU WEI-ZEN
9 granted patents·1 pending application·156 citations·filing 1999–2003
89Inventor score
Files withTAIWAN SEMICONDUCTOR MFG10
Top patents by PatentIndex Score
10 records- 0184US6294295B1Variable transmittance phase shifter to compensate for side lobe problem on rim type attenuating phase shifting masksTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Sep 25, 2001·26 cites·21 claims
- 0278US6428938B1Phase-shift mask for printing high-resolution images and a method of fabricationTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Aug 6, 2002·17 cites·18 claims
- 0373US6872507B2Radiation correction method for electron beam lithographyTAIWAN SEMICONDUCTOR MFG·Filed 2002·Granted Mar 29, 2005·30 cites·12 claims
- 0472US6361911B1Using a dummy frame pattern to improve CD control of VSB E-beam exposure system and the proximity effect of laser beam exposure system and Gaussian E-beam exposure systemTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Mar 26, 2002·29 cites·3 claims
- 0567US6277528B1Method to change transmittance of attenuated phase-shifting masksTAIWAN SEMICONDUCTOR MFG·Filed 2000·Granted Aug 21, 2001·9 cites·19 claims
- 0664US6190809B1Cost-effective method to fabricate a combined attenuated-alternating phase shift maskTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Feb 20, 2001·24 cites·42 claims
- 0750US6251547B1Simplified process for making an outrigger type phase shift maskTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Jun 26, 2001·12 cites·30 claims
- 0843US6261725B1Phase angle modulation of PSM by chemical treatment methodTAIWAN SEMICONDUCTOR MFG·Filed 1999·Granted Jul 17, 2001·8 cites·15 claims
- 0940US7037628B2Method of a floating pattern loading system in mask dry-etching critical dimension controlTAIWAN SEMICONDUCTOR MFG·Filed 2003·Granted May 2, 2006·1 cites·13 claims
- 1035US2003228047A1Photomask transparent substrate protection during removal of opaque photomask defectsTAIWAN SEMICONDUCTOR MFG·Filed 2002·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →