Inventor · disambiguated record
Robert L. Bristol
Also filed as: BRISTOL ROBERT · BRISTOL ROBERT L · BRISTOL ROBERT LINDSEY
80 granted patents·19 pending applications·614 citations·filing 2002–2024
99Inventor score
Top patents by PatentIndex Score
99 records- 0197US9041217B1Self-aligned via patterning with multi-colored photobuckets for back end of line (BEOL) interconnectsBRISTOL ROBERT L·Filed 2013·Granted May 26, 2015·53 cites·5 claims
- 0297US8993404B2Metal-insulator-metal capacitor formation techniquesINTEL CORP·Filed 2013·Granted Mar 31, 2015·92 cites·23 claims
- 0396US10892223B2Advanced lithography and self-assembled devicesINTEL CORP·Filed 2016·Granted Jan 12, 2021·11 cites·25 claims
- 0496US9793163B2Subtractive self-aligned via and plug patterning for back end of line (BEOL) interconnectsINTEL CORP·Filed 2013·Granted Oct 17, 2017·28 cites·11 claims
- 0595US12218052B2Advanced lithography and self-assembled devicesINTEL CORP·Filed 2023·Granted Feb 4, 2025·1 cites·20 claims
- 0695US9406512B2Self-aligned via patterning with multi-colored photobuckets for back end of line (BEOL) interconnectsBRISTOL ROBERT L·Filed 2015·Granted Aug 2, 2016·16 cites·16 claims
- 0794US9236342B2Self-aligned via and plug patterning with photobuckets for back end of line (BEOL) interconnectsBRISTOL ROBERT L·Filed 2013·Granted Jan 12, 2016·21 cites·20 claims
- 0893US10269623B2Image tone-reversal with a dielectric using bottom-up cross-linking for back end of line (BEOL) interconnectsINTEL CORP·Filed 2015·Granted Apr 23, 2019·10 cites·5 claims
- 0993US9005875B2Pre-patterned hard mask for ultrafast lithographic imagingINTEL CORP·Filed 2013·Granted Apr 14, 2015·12 cites·20 claims
- 1092US10366903B2Textile patterning for subtractively-patterned self-aligned interconnects, plugs, and viasINTEL CORP·Filed 2015·Granted Jul 30, 2019·6 cites·10 claims
- 1191US11854787B2Advanced lithography and self-assembled devicesINTEL CORP·Filed 2022·Granted Dec 26, 2023·1 cites·19 claims
- 1291US7230258B2Plasma-based debris mitigation for extreme ultraviolet (EUV) light sourceINTEL CORP·Filed 2003·Granted Jun 12, 2007·54 cites·1 claims
- 1390US9932671B2Precursor and process design for photo-assisted metal atomic layer deposition (ALD) and chemical vapor deposition (CVD)INTEL CORP·Filed 2014·Granted Apr 3, 2018·10 cites·8 claims
- 1490US6968850B2In-situ cleaning of light source collector opticsINTEL CORP·Filed 2002·Granted Nov 29, 2005·30 cites·19 claims
- 1589US9548269B2Diagonal hardmasks for improved overlay in fabricating back end of line (BEOL) interconnectsMYERS ALAN M·Filed 2015·Granted Jan 17, 2017·7 cites·9 claims
- 1689US9209077B2Diagonal hardmasks for improved overlay in fabricating back end of line (BEOL) interconnectsMYERS ALAN M·Filed 2013·Granted Dec 8, 2015·10 cites·17 claims
- 1788US10366950B2Bottom-up selective dielectric cross-linking to prevent via landing shortsINTEL CORP·Filed 2015·Granted Jul 30, 2019·5 cites·15 claims
- 1888US9530733B2Forming layers of materials over small regions by selective chemical reaction including limiting enchroachment of the layers over adjacent regionsINTEL CORP·Filed 2013·Granted Dec 27, 2016·8 cites·20 claims
- 1988US6963071B2Debris mitigation deviceINTEL CORP·Filed 2002·Granted Nov 8, 2005·26 cites·10 claims
- 2088US2025125260A1Advanced lithography and self-assembled devicesINTEL CORP·Filed 2024·Application pending·0 cites
- 2187US10957844B2Magneto-electric spin orbit (MESO) structures having functional oxide viasINTEL CORP·Filed 2016·Granted Mar 23, 2021·3 cites·23 claims
- 2287US7153615B2Extreme ultraviolet pellicle using a thin film and supportive meshINTEL CORP·Filed 2003·Granted Dec 26, 2006·27 cites·20 claims
- 2386US9443922B2Metal-insulator-metal capacitor formation techniquesINTEL CORP·Filed 2015·Granted Sep 13, 2016·4 cites·20 claims
- 2486US7374867B2Enhancing photoresist performance using electric fieldsINTEL CORP·Filed 2003·Granted May 20, 2008·21 cites·10 claims
- 2585US11854882B2Subtractive plug and tab patterning with photobuckets for back end of line (BEOL) spacer-based interconnectsTAHOE RES LTD·Filed 2020·Granted Dec 26, 2023·1 cites·25 claims
- 2685US11373950B2Advanced lithography and self-assembled devicesINTEL CORP·Filed 2020·Granted Jun 28, 2022·1 cites·19 claims
- 2785US11320734B2Ligand-capped main group nanoparticles as high absorption extreme ultraviolet lithography resistsINTEL CORP·Filed 2016·Granted May 3, 2022·2 cites·16 claims
- 2885US10615117B2Self-aligned viaINTEL CORP·Filed 2016·Granted Apr 7, 2020·4 cites·14 claims
- 2985US6809327B2EUV source boxINTEL CORP·Filed 2002·Granted Oct 26, 2004·22 cites·29 claims
- 3084US10553532B2Structure and method to self align via to top and bottom of tight pitch metal interconnect layersINTEL CORP·Filed 2014·Granted Feb 4, 2020·6 cites·25 claims
- 3184US7078700B2Optics for extreme ultraviolet lithographyINTEL CORP·Filed 2004·Granted Jul 18, 2006·22 cites·23 claims
- 3284US2025029876A1Subtractive plug and tab patterning with photobuckets for back end of line (beol) spacer-based interconnectsTAHOE RES LTD·Filed 2024·Application pending·0 cites
- 3381US10644113B2Quantum dot array devicesINTEL CORP·Filed 2016·Granted May 5, 2020·2 cites·20 claims
- 3481US9553018B2Self-aligned via and plug patterning with photobuckets for back end of line (BEOL) interconnectsINTEL CORP·Filed 2015·Granted Jan 24, 2017·3 cites·11 claims
- 3580US2024213095A1Subtractive plug and tab patterning with photobuckets for back end of line (beol) spacer-based interconnectsTAHOE RES LTD·Filed 2023·Application pending·0 cites
- 3679US10109583B2Method for creating alternate hardmask cap interconnect structure with increased overlay marginINTEL CORP·Filed 2014·Granted Oct 23, 2018·4 cites·25 claims
- 3779US7652272B2Plasma-based debris mitigation for extreme ultraviolet (EUV) light sourceINTEL CORP·Filed 2007·Granted Jan 26, 2010·11 cites·32 claims
- 3878US11137681B2Lined photobucket structure for back end of line (BEOL) interconnect formationINTEL CORP·Filed 2016·Granted Oct 5, 2021·2 cites·19 claims
- 3977US11874600B2Ligand-capped main group nanoparticles as high absorption extreme ultraviolet lithography resistsINTEL CORP·Filed 2022·Granted Jan 16, 2024·0 cites·14 claims
- 4077US11594599B2Quantum dot array devicesINTEL CORP·Filed 2016·Granted Feb 28, 2023·2 cites·28 claims
- 4177US11315798B2Two-stage bake photoresist with releasable quencherINTEL CORP·Filed 2016·Granted Apr 26, 2022·2 cites·11 claims
- 4277US9418888B2Non-lithographically patterned directed self assembly alignment promotion layersINTEL CORP·Filed 2013·Granted Aug 16, 2016·2 cites·25 claims
- 4377US2024360264A1Chemical compositions & methods of patterning microelectronic device structuresINTEL CORP·Filed 2024·Application pending·0 cites
- 4476US12261057B2Textile patterning for subtractively-patterned self-aligned interconnects, plugs, and viasTAHOE RES LTD·Filed 2022·Granted Mar 25, 2025·0 cites·11 claims
- 4576US7355190B2Debris mitigation deviceINTEL CORP·Filed 2005·Granted Apr 8, 2008·3 cites·20 claims
- 4675US6825988B2Etched silicon diffraction gratings for use as EUV spectral purity filtersINTEL CORP·Filed 2002·Granted Nov 30, 2004·15 cites·25 claims
- 4774US7413586B2In-tool and out-of-tool protection of extreme ultraviolet (EUV) reticlesINTEL CORP·Filed 2004·Granted Aug 19, 2008·10 cites·8 claims
- 4871US12037434B2Chemical compositions and methods of patterning microelectronic device structuresINTEL CORP·Filed 2021·Granted Jul 16, 2024·0 cites·6 claims
- 4971US11953826B2Lined photobucket structure for back end of line (BEOL) interconnect formationINTEL CORP·Filed 2021·Granted Apr 9, 2024·0 cites·20 claims
- 5071US10867853B2Subtractive plug and tab patterning with photobuckets for back end of line (BEOL) spacer-based interconnectsINTEL CORP·Filed 2016·Granted Dec 15, 2020·1 cites·23 claims
Showing the top 50 of 99 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →