Inventor · disambiguated record
Kazuyuki Toyoda
Also filed as: TOYODA KAZUYUKI
39 granted patents·32 pending applications·332 citations·filing 1997–2024
97Inventor score
Files withHITACHI INT ELECTRIC INC51KOKUSAI ELECTRIC CORP5NISHITANI EISUKE3MIYA HIRONOBU2TOYODA KAZUYUKI2
Top patents by PatentIndex Score
71 records- 0196US7900580B2Substrate processing apparatus and reaction containerHITACHI INT ELECTRIC INC·Filed 2007·Granted Mar 8, 2011·27 cites·13 claims
- 0295US9487863B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2015·Granted Nov 8, 2016·8 cites·8 claims
- 0394US7861668B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2007·Granted Jan 4, 2011·19 cites·5 claims
- 0493US9431220B1Substrate processing apparatus and substrate processing systemHITACHI INT ELECTRIC INC·Filed 2015·Granted Aug 30, 2016·10 cites·15 claims
- 0593US8261692B2Substrate processing apparatus and reaction containerKONTANI TADASHI·Filed 2010·Granted Sep 11, 2012·10 cites·7 claims
- 0693US7779785B2Production method for semiconductor device and substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2006·Granted Aug 24, 2010·21 cites·3 claims
- 0792US8227346B2Method of producing semiconductor deviceMIYA HIRONOBU·Filed 2011·Granted Jul 24, 2012·12 cites·10 claims
- 0890US8047158B2Substrate processing apparatus and reaction containerHITACHI INT ELECTRIC INC·Filed 2007·Granted Nov 1, 2011·8 cites·11 claims
- 0990US8039404B2Production method for semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2010·Granted Oct 18, 2011·9 cites·3 claims
- 1089US9171734B1Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2014·Granted Oct 27, 2015·8 cites·19 claims
- 1189US8020514B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2009·Granted Sep 20, 2011·9 cites·6 claims
- 1288US6053980ASubstrate processing apparatusKOKUSAI ELECTRIC CO LTD·Filed 1997·Granted Apr 25, 2000·120 cites·67 claims
- 1386US8925562B1Substrate processing apparatus and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2014·Granted Jan 6, 2015·6 cites·13 claims
- 1486US8028652B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2007·Granted Oct 4, 2011·7 cites·18 claims
- 1584US9064695B1Substrate processing apparatus, non-transitory computer-readable recording medium and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2014·Granted Jun 23, 2015·5 cites·8 claims
- 1684US8105957B2Method of producing semiconductor deviceMIYA HIRONOBU·Filed 2009·Granted Jan 31, 2012·7 cites·12 claims
- 1783US2024222086A1Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2024·Application pending·0 cites
- 1882US9163309B2Substrate processing apparatus, method of manufacturing semiconductor device and non-transitory computer-readable recording mediumHITACHI INT ELECTRIC INC·Filed 2014·Granted Oct 20, 2015·5 cites·17 claims
- 1982US9039912B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2012·Granted May 26, 2015·3 cites·15 claims
- 2081US9070554B2Method of manufacturing semiconductor device, substrate processing apparatus, and recording mediumHITACHI INT ELECTRIC INC·Filed 2014·Granted Jun 30, 2015·4 cites·19 claims
- 2180US10943806B2Substrate processing apparatus, method of manufacturing semiconductor device, and non- transitory computer-readable recording mediumKOKUSAI ELECTRIC CORP·Filed 2018·Granted Mar 9, 2021·2 cites·9 claims
- 2280US9818630B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2016·Granted Nov 14, 2017·3 cites·6 claims
- 2379US9508546B2Method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2014·Granted Nov 29, 2016·3 cites·1 claims
- 2476US9666494B2Method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2015·Granted May 30, 2017·2 cites·16 claims
- 2572US9023429B2Method of manufacturing semiconductor device and substrate processing apparatusTAKESHIMA YUICHIRO·Filed 2012·Granted May 5, 2015·4 cites·11 claims
- 2671US9991179B2Method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2016·Granted Jun 5, 2018·1 cites·17 claims
- 2769US8193101B2Substrate processing apparatus and semiconductor device manufacturing method for forming filmSATO TAKETOSHI·Filed 2009·Granted Jun 5, 2012·3 cites·5 claims
- 2867US9735068B2Method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2016·Granted Aug 15, 2017·1 cites·16 claims
- 2965US7958842B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2005·Granted Jun 14, 2011·2 cites·14 claims
- 3064US6576063B2Apparatus and method for use in manufacturing a semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2001·Granted Jun 10, 2003·8 cites·16 claims
- 3163US8518182B2Substrate processing apparatusOGAWA SHIZUE·Filed 2011·Granted Aug 27, 2013·2 cites·5 claims
- 3261US8544411B2Batch-type remote plasma processing apparatusTOYODA KAZUYUKI·Filed 2009·Granted Oct 1, 2013·1 cites·5 claims
- 3361US2016276135A1Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2016·Application pending·0 cites
- 3460US2019218664A1Substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2019·Application pending·0 cites
- 3559US9373499B2Batch-type remote plasma processing apparatusHITACHI INT ELECTRIC INC·Filed 2015·Granted Jun 21, 2016·0 cites·18 claims
- 3657US2019393057A1Substrate processing apparatusKOKUSAI ELECTRIC CORP·Filed 2019·Application pending·0 cites
- 3755US2019221468A1Substrate Processing ApparatusKOKUSAI ELECTRIC CORP·Filed 2019·Application pending·0 cites
- 3853US10224227B2Method of processing substrateHITACHI INT ELECTRIC INC·Filed 2018·Granted Mar 5, 2019·0 cites·19 claims
- 3953US2012258566A1Substrate processing apparatus, method for manufacturing solar battery, and method for manufacturing substrateNISHITANI EISUKE·Filed 2012·Application pending·0 cites
- 4051US2018277405A1Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2017·Application pending·0 cites
- 4150US9502236B2Substrate processing apparatus, non-transitory computer-readable recording medium and method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2015·Granted Nov 22, 2016·0 cites·13 claims
- 4250US7033937B2Apparatus and method for use in manufacturing a semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2003·Granted Apr 25, 2006·2 cites·18 claims
- 4350US2016093476A1Substrate Processing Apparatus, Method of Manufacturing Semiconductor Device and Non-Transitory Computer-Readable Recording MediumHITACHI INT ELECTRIC INC·Filed 2015·Application pending·0 cites
- 4449US2010087069A1Method of manufacturing semiconductor device and substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2009·Application pending·0 cites
- 4548US2004025786A1Substrate processing apparatus and reaction containerFiled 2003·Application pending·0 cites
- 4648US2017159181A1Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2016·Application pending·0 cites
- 4748US2016276183A1Substrate Processing ApparatusHITACHI INT ELECTRIC INC·Filed 2016·Application pending·0 cites
- 4847US10115583B2Method of manufacturing semiconductor deviceHITACHI INT ELECTRIC INC·Filed 2017·Granted Oct 30, 2018·0 cites·19 claims
- 4946US10818476B2Substrate processing apparatusHITACHI INT ELECTRIC INC·Filed 2017·Granted Oct 27, 2020·0 cites·15 claims
- 5046US2010323507A1Substrate processing apparatus and producing method of deviceHITACHI INT ELECTRIC INC·Filed 2010·Application pending·0 cites
Showing the top 50 of 71 patent records by PatentIndex Score.
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →