Inventor · disambiguated record
Min-Suk Cha
Also filed as: CHA MIN SUK
8 granted patents·4 pending applications·34 citations·filing 2001–2017
83Inventor score
Top patents by PatentIndex Score
12 records- 0184US8272206B2Apparatus for plasma reaction and system for reduction of particulate materials in exhaust gas using the sameLEE DAE-HOON·Filed 2007·Granted Sep 25, 2012·13 cites·15 claims
- 0276US8852520B2Plasma reactor for abating hazardous materials and driving method thereofHUR MIN·Filed 2010·Granted Oct 7, 2014·7 cites·12 claims
- 0369US8524162B2Plasma reaction, apparatus for decreasing NOx by occlusion catalyst using the sameLEE DAE HOON·Filed 2012·Granted Sep 3, 2013·3 cites·4 claims
- 0465US10499486B2In-liquid plasma devices and methods of use thereofUNIV KING ABDULLAH SCI & TECH·Filed 2017·Granted Dec 3, 2019·2 cites·20 claims
- 0563US8568662B2Plasma reaction apparatus, plasma reaction method using the same, plasma reaction method of persistent gas, and apparatus for decreasing NOx by occlusion catalystLEE DAE HOON·Filed 2006·Granted Oct 29, 2013·3 cites·6 claims
- 0662US8574504B2Plasma scrubberKIM KWAN-TAE·Filed 2008·Granted Nov 5, 2013·3 cites·11 claims
- 0762US8257455B2Plasma burner and diesel particulate filter trapLEE DAE-HOON·Filed 2008·Granted Sep 4, 2012·3 cites·15 claims
- 0855US2018215616A1Methods for reformation of gaseous hydrocarbons using electrical dischargeUNIV KING ABDULLAH SCI & TECH·Filed 2016·Application pending·0 cites
- 0955US2018208464A1Plasma devices for hydrocarbon reformationUNIV KING ABDULLAH SCI & TECH·Filed 2016·Application pending·0 cites
- 1037US2017370587A1Systems and methods for controlling flame instabilityUNIV KING ABDULLAH SCI & TECH·Filed 2016·Application pending·0 cites
- 1136US10328410B2Systems and methods for producing electrical discharges in compositionsUNIV KING ABDULLAH SCI & TECH·Filed 2015·Granted Jun 25, 2019·0 cites·19 claims
- 1233US2002070127A1Catalyst reactor for processing hazardous gas using non-thermal plasma and dielectric heat and method threreofFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →