Inventor · disambiguated record
Hiromi Kiyose
Also filed as: KIYOSE HIROMI
15 granted patents·6 pending applications·36 citations·filing 1992–2019
89Inventor score
Top patents by PatentIndex Score
21 records- 0187US9953840B2Substrate processing method and substrate processing systemTOKYO ELECTRON LTD·Filed 2016·Granted Apr 24, 2018·5 cites·11 claims
- 0286US10504718B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Dec 10, 2019·5 cites·10 claims
- 0385US10395950B2Substrate processing apparatus, substrate processing method, and recording mediumTOKYO ELECTRON LTD·Filed 2017·Granted Aug 27, 2019·5 cites·10 claims
- 0484US10037901B2Substrate liquid treatment apparatus, method of cleaning substrate liquid treatment apparatus and non-transitory storage mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jul 31, 2018·5 cites·8 claims
- 0580US10950465B2Method of cleaning substrate processing apparatus and system of cleaning substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Mar 16, 2021·3 cites·7 claims
- 0675US10619922B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Apr 14, 2020·2 cites·13 claims
- 0772US9721813B2Liquid processing apparatus with cleaning jigTOKYO ELECTRON LTD·Filed 2013·Granted Aug 1, 2017·3 cites·8 claims
- 0869US8211810B2Substrate processing apparatus and substrate processing method for performing etching process with phosphoric acid solutionKIYOSE HIROMI·Filed 2008·Granted Jul 3, 2012·4 cites·5 claims
- 0949US11201050B2Substrate processing method, recording medium and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2019·Granted Dec 14, 2021·0 cites·14 claims
- 1044US11133176B2Substrate processing method, recording medium and substrate processing systemTOKYO ELECTRON LTD·Filed 2018·Granted Sep 28, 2021·0 cites·6 claims
- 1143US11508588B2Substrate treatment device and substrate treatment methodTOKYO ELECTRON LTD·Filed 2018·Granted Nov 22, 2022·0 cites·9 claims
- 1243US2014373877A1Liquid processing apparatus and liquid processing methodTOKYO ELECTRON LTD·Filed 2014·Application pending·0 cites
- 1342US11322371B2Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2018·Granted May 3, 2022·0 cites·6 claims
- 1440US2008066863A1Substrate processing apparatus for performing etching process with phosphoric acid solutionKIYOSE HIROMI·Filed 2007·Application pending·0 cites
- 1539US2007221252A1High-pressure processing methodKIYOSE HIROMI·Filed 2006·Application pending·0 cites
- 1638US2018254180A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2018·Application pending·0 cites
- 1737US10153182B2Substrate processing apparatusHIGASHI NOBORU·Filed 2012·Granted Dec 11, 2018·0 cites·4 claims
- 1837US2018096863A1Substrate processing method, substrate processing apparatus, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Application pending·0 cites
- 1935US2003170988A1Substrate treatment apparatus and substrate treatment methodDAINIPPON SCREEN MFG·Filed 2003·Application pending·0 cites
- 2034US10226959B2Substrate processing apparatusKIYOSE HIROMI·Filed 2011·Granted Mar 12, 2019·0 cites·4 claims
- 2130US5401686AMethod of uniformly diffusing impurities into semiconductor wafersROHM CO LTD·Filed 1992·Granted Mar 28, 1995·4 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →