Inventor · disambiguated record
Robert Veltrop
Also filed as: VELTROP ROBERT · VELTROP ROBERT G
12 granted patents·3 pending applications·1,097 citations·filing 1994–2006
94Inventor score
Top patents by PatentIndex Score
15 records- 0198US6583572B2Inductive plasma processor including current sensor for plasma excitation coilLAM RES CORP·Filed 2001·Granted Jun 24, 2003·458 cites·14 claims
- 0298US6164241AMultiple coil antenna for inductively-coupled plasma generation systemsLAM RES CORP·Filed 1998·Granted Dec 26, 2000·225 cites·54 claims
- 0397US6463875B1Multiple coil antenna for inductively-coupled plasma generation systemsLAM RES CORP·Filed 2000·Granted Oct 15, 2002·110 cites·20 claims
- 0493US7096819B2Inductive plasma processor having coil with plural windings and method of controlling plasma densityLAM RES CORP·Filed 2001·Granted Aug 29, 2006·47 cites·26 claims
- 0593US6155199AParallel-antenna transformer-coupled plasma generation systemLAM RES CORP·Filed 1998·Granted Dec 5, 2000·91 cites·34 claims
- 0688US7563723B2Critical dimension control for integrated circuitsMICRON TECHNOLOGY INC·Filed 2006·Granted Jul 21, 2009·11 cites·18 claims
- 0783US6716758B1Aspect ratio controlled etch selectivity using time modulated DC bias voltageMICRON TECHNOLOGY INC·Filed 1999·Granted Apr 6, 2004·52 cites·37 claims
- 0881US5589737APlasma processor for large workpiecesLAM RES CORP·Filed 1994·Granted Dec 31, 1996·75 cites·36 claims
- 0978US7271106B2Critical dimension control for integrated circuitsMICRON TECHNOLOGY INC·Filed 2004·Granted Sep 18, 2007·17 cites·28 claims
- 1068US6527912B2Stacked RF excitation coil for inductive plasma processorLAM RES CORP·Filed 2001·Granted Mar 4, 2003·7 cites·31 claims
- 1153US7208407B2Flash memory cells with reduced distances between cell elementsMICRON TECHNOLOGY INC·Filed 2004·Granted Apr 24, 2007·4 cites·14 claims
- 1251US2006105577A1Aspect ratio controlled etch selectivity using time modulated DC bias voltageDONOHOE KEVIN G·Filed 2005·Application pending·0 cites
- 1348US7580279B2Flash memory cells with reduced distances between cell elementsMICRON TECHNOLOGY INC·Filed 2006·Granted Aug 25, 2009·0 cites·19 claims
- 1444US2004045506A1Inductive plasma processor methodLAM RES CORP·Filed 2003·Application pending·0 cites
- 1543US2004161941A1Aspect ratio controlled etch selectivity using time modulated DC bias voltageFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →