Inventor · disambiguated record
Wolfgang Merkel
Also filed as: MERKEL WOLFGANG
8 granted patents·2 pending applications·91 citations·filing 1980–2024
81Inventor score
Files withZEISS CARL SMT GMBH6DYNAMIT NOBEL AG1HUELS TROISDORF1MUENZ HOLGER1REPA FEINSTANZWERK GMBH1
Top patents by PatentIndex Score
10 records- 0187US4369426AEmergency distress signal system for motor vehiclesREPA FEINSTANZWERK GMBH·Filed 1980·Granted Jan 18, 1983·65 cites·11 claims
- 0277US4783564AMethod for the preparation of 1,2-dichloroethaneHUELS TROISDORF·Filed 1987·Granted Nov 8, 1988·20 cites·17 claims
- 0364US2025258436A1Euv collector for use in an euv projection exposure apparatusZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0454US10578974B2Optical element, in particular for a microlithographic projection exposure apparatusZEISS CARL SMT GMBH·Filed 2019·Granted Mar 3, 2020·0 cites·20 claims
- 0553US11231658B2Arrangement for an EUV lithography apparatusZEISS CARL SMT GMBH·Filed 2020·Granted Jan 25, 2022·0 cites·17 claims
- 0653US11099484B2Method for repairing reflective optical elements for EUV lithographyZEISS CARL SMT GMBH·Filed 2019·Granted Aug 24, 2021·0 cites·20 claims
- 0752US4346230AProcess for the preparation of dimethyl terephthalateDYNAMIT NOBEL AG·Filed 1980·Granted Aug 24, 1982·6 cites·9 claims
- 0844US10503075B2EUV CollectorZEISS CARL SMT GMBH·Filed 2018·Granted Dec 10, 2019·0 cites·20 claims
- 0941US2012154895A1Optical system for generating a light beam for treating a substrateMUENZ HOLGER·Filed 2012·Application pending·0 cites
- 1039US10146048B2Optical assembly, projection system, metrology system and EUV lithography apparatusZEISS CARL SMT GMBH·Filed 2016·Granted Dec 4, 2018·0 cites·22 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →