Inventor · disambiguated record
Go-Un Kim
Also filed as: KIM GO UN
10 granted patents·4 pending applications·8 citations·filing 2009–2023
79Inventor score
Top patents by PatentIndex Score
14 records- 0176US9665003B2Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsCHOI YOO-JEONG·Filed 2014·Granted May 30, 2017·3 cites·18 claims
- 0271US8685272B2Composition for etching silicon oxide layer, method for etching semiconductor device using the same, and composition for etching semiconductor deviceKIM GO-UN·Filed 2009·Granted Apr 1, 2014·5 cites·15 claims
- 0352US10723916B2Organic film CMP slurry composition and polishing method using sameSAMSUNG SDI CO LTD·Filed 2018·Granted Jul 28, 2020·0 cites·20 claims
- 0452US2016068711A1Organic Film CMP Slurry Composition and Polishing Method Using SameSAMSUNG SDI CO LTD·Filed 2014·Application pending·0 cites
- 0550US9845444B2Cleaning composition after chemical mechanical polishing of organic film and cleaning method using the sameSAMSUNG ELECTRONICS CO LTD·Filed 2015·Granted Dec 19, 2017·0 cites·14 claims
- 0650US9738787B2Composition for forming silica-based insulating layer, method for preparing composition for forming silica-based insulating layer, silica-based insulating layer, and method for manufacturing silica-based insulating layerCHEIL IND INC·Filed 2013·Granted Aug 22, 2017·0 cites·9 claims
- 0750US2024014044A1Etching composition for selectively etching silicon nitride, etching method, and manufacturing method of semiconductor device using the sameSK HYNIX INC·Filed 2023·Application pending·0 cites
- 0848US9890255B2Modified hydrogenated polysiloxazane, composition comprising same for forming silica-based insulation layer, method for preparing composition for formingCHEIL IND INC·Filed 2013·Granted Feb 13, 2018·0 cites·19 claims
- 0942US10287468B2CMP slurry composition for organic film and polishing method using sameSAMSUNG SDI CO LTD·Filed 2015·Granted May 14, 2019·0 cites·11 claims
- 1038US10345706B2Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask compositionSONG HYUN JI·Filed 2014·Granted Jul 9, 2019·0 cites·10 claims
- 1137US9240443B2Process of preparing a gap filler agent, a gap filler agent prepared using same, and a method for manufacturing semiconductor capacitor using the gap filler agentBAE JIN-HEE·Filed 2013·Granted Jan 19, 2016·0 cites·16 claims
- 1236US9312122B2Rinse liquid for insulating film and method of rinsing insulating filmBAE JIN-HEE·Filed 2013·Granted Apr 12, 2016·0 cites·11 claims
- 1333US2020075991A1Medium-low heat driven sodium-based secondary battery and manufacturing method thereforRES INST IND SCIENCE & TECH·Filed 2016·Application pending·0 cites
- 1432US2012172272A1Cleaning composition for semiconductor device and method of cleaning semiconductor device using the samePARK YONG YEOP·Filed 2011·Application pending·0 cites
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