Inventor · disambiguated record
Eric Jacquinot
Also filed as: JACQUINOT ERIC
16 granted patents·4 pending applications·184 citations·filing 1992–2023
93Inventor score
Files withAZ ELECTRONIC MATERIALS USA5CLARIANT FRANCE SA5MERCK PATENT GMBH3HOECHST AG2JACQUINOT ERIC2
Top patents by PatentIndex Score
20 records- 0183US5795556AXerogels and process for their preparationHOECHST AG·Filed 1996·Granted Aug 18, 1998·52 cites·15 claims
- 0273US7629391B2Process for the preparation of aqueous suspensions of anionic colloidal silica having a neutral pH and applications thereofAZ ELECTRONIC MATERIALS USA·Filed 2002·Granted Dec 8, 2009·10 cites·8 claims
- 0371US7651719B2Process for the preparation of aqueous suspensions of anionic colloidal silica having a neutral pH and applications thereofAZ ELECTRONIC MATERIALS USA·Filed 2007·Granted Jan 26, 2010·0 cites·11 claims
- 0461US5419846AStable granules for detergents, cleaning agents and disinfectantsHOECHST AG·Filed 1993·Granted May 30, 1995·20 cites·26 claims
- 0561US5256725APolymerizable luminescent fluid composition and its useHOECHST FRANCE·Filed 1992·Granted Oct 26, 1993·16 cites·14 claims
- 0660US6386950B1Process for mechanical chemical polishing of layer of aluminium or aluminium alloy conducting materialCLARIANT FRANCE SA·Filed 2000·Granted May 14, 2002·8 cites·16 claims
- 0760US6362108B1Composition for mechanical chemical polishing of layers in an insulating material based on a polymer with a low dielectric constantCLARIANT FRANCE SA·Filed 2000·Granted Mar 26, 2002·5 cites·10 claims
- 0859US2024351889A1Method for producing silica particles, silica particles produced by such method, compositions and uses of such silica particlesMERCK PATENT GMBH·Filed 2022·Application pending·0 cites
- 0958US8308985B2Process for the preparation of aqueous suspensions of anionic colloidal silica having a neutral PH and applications thereofJACQUINOT ERIC·Filed 2012·Granted Nov 13, 2012·0 cites·9 claims
- 1058US6136912ASilicoacrylic compositions, preparation process and use for obtaining coatings which are hardenable thermally or by radiationCLARIANT FRANCE SA·Filed 1998·Granted Oct 24, 2000·14 cites·20 claims
- 1157US2025215296A1Negatively charged silica particles, method of producing such particles, compositions comprising such particles, and a method of chemical-mechanical polishing using such particlesMERCK PATENT GMBH·Filed 2023·Application pending·0 cites
- 1255US6043159AChemical mechanical polishing process for layers of isolating materials based on silicon derivatives or siliconCLARIANT CHIMIE SA·Filed 1997·Granted Mar 28, 2000·21 cites·19 claims
- 1353US8153107B2Process for the preparation of aqueous suspensions of anionic colloidal silica having a neutral pH and applications thereofJACQUINOT ERIC·Filed 2011·Granted Apr 10, 2012·0 cites·20 claims
- 1453US6126518AChemical mechanical polishing process for layers of semiconductor or isolating materialsCLARIANT FRANCE SA·Filed 1998·Granted Oct 3, 2000·22 cites·15 claims
- 1551US7252695B2Abrasive composition for the integrated circuit electronics industryAZ ELECTRONIC MATERIALS USA·Filed 2006·Granted Aug 7, 2007·0 cites·14 claims
- 1650US2023374346A1Surface-modified silica particles and compositions comprising such particlesMERCK PATENT GMBH·Filed 2021·Application pending·0 cites
- 1744US6302765B1Process for mechanical chemical polishing of a layer in a copper-based materialCLARIANT FRANCE SA·Filed 1999·Granted Oct 16, 2001·12 cites·17 claims
- 1840US2005276891A1Use of colloidal anionic silica sols as clarifying agentsFALK UWE·Filed 2003·Application pending·0 cites
- 1935US7077727B2Process for chemical-mechanical polishing of metal substratesAZ ELECTRONIC MATERIALS USA·Filed 2003·Granted Jul 18, 2006·1 cites·22 claims
- 2032US7144814B2Abrasive composition for the integrated circuits electronics industryAZ ELECTRONIC MATERIALS USA·Filed 1999·Granted Dec 5, 2006·3 cites·24 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →