Inventor · disambiguated record
Takahisa Otsuka
Also filed as: OTSUKA TAKAHISA
18 granted patents·4 pending applications·57 citations·filing 2007–2021
91Inventor score
Top patents by PatentIndex Score
22 records- 0194US7877895B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2007·Granted Feb 1, 2011·30 cites·7 claims
- 0281US11712710B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2019·Granted Aug 1, 2023·3 cites·11 claims
- 0378US7628612B2Heat treatment apparatus, heat treatment method, and computer readable storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Dec 8, 2009·6 cites·2 claims
- 0476US7816276B2Substrate treatment system, substrate treatment method, and computer readable storage mediumTOKYO ELECTRON LTD·Filed 2007·Granted Oct 19, 2010·4 cites·6 claims
- 0575US8181356B2Substrate processing methodOTSUKA TAKAHISA·Filed 2010·Granted May 22, 2012·3 cites·6 claims
- 0674US8587763B2Substrate processing method, substrate processing system, and computer-readable recording medium recording program thereonOTSUKA TAKAHISA·Filed 2011·Granted Nov 19, 2013·3 cites·15 claims
- 0772US8247164B2Resist film forming methodOTSUKA TAKAHISA·Filed 2010·Granted Aug 21, 2012·2 cites·14 claims
- 0870US8168378B2Substrate treatment system, substrate treatment method, and computer readable storage mediumOTSUKA TAKAHISA·Filed 2010·Granted May 1, 2012·2 cites·5 claims
- 0967US8871301B2Coating treatment apparatus, coating treatment method, and non-transitory computer storage mediumTACHIBANA KOUZOU·Filed 2012·Granted Oct 28, 2014·3 cites·8 claims
- 1063US9865483B2Substrate liquid processing method, substrate liquid processing apparatus, and recording mediumTOKYO ELECTRON LTD·Filed 2015·Granted Jan 9, 2018·1 cites·12 claims
- 1160US11862486B2Substrate liquid processing apparatus, substrate liquid processing method and recording mediumTOKYO ELECTRON LTD·Filed 2020·Granted Jan 2, 2024·0 cites·5 claims
- 1253US7977038B2Substrate processing method, substrate processing system, and computer-readable recording medium recording program thereonTOKYO ELECTRON LTD·Filed 2007·Granted Jul 12, 2011·0 cites·9 claims
- 1350US10685858B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Jun 16, 2020·0 cites·8 claims
- 1449US10770316B2Substrate liquid processing apparatus, substrate liquid processing method and recording mediumTOKYO ELECTRON LTD·Filed 2016·Granted Sep 8, 2020·0 cites·4 claims
- 1548US7938587B2Substrate processing method, computer storage medium and substrate processing systemTOKYO ELECTRON LTD·Filed 2009·Granted May 10, 2011·0 cites·15 claims
- 1647US2023264233A1Liquid processing apparatus and liquid processing methodTOKYO ELECTRON LTD·Filed 2021·Application pending·0 cites
- 1746US11769661B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2020·Granted Sep 26, 2023·0 cites·5 claims
- 1843US2020070196A1Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1942US2014137893A1Substrate processing apparatus, substrate processing method and storage mediumTOKYO ELECTRON LTD·Filed 2013·Application pending·0 cites
- 2040US9108228B2Liquid processing apparatus having switchable nozzlesTOKYO ELECTRON LTD·Filed 2013·Granted Aug 18, 2015·0 cites·15 claims
- 2137US11024518B2Substrate processing apparatus, substrate processing method and recording mediumTOKYO ELECTRON LTD·Filed 2016·Granted Jun 1, 2021·0 cites·16 claims
- 2237US2017084470A1Substrate processing apparatus and cleaning method of processing chamberTOKYO ELECTRON LTD·Filed 2016·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →