Inventor · disambiguated record
Scott M. Mansfield
Also filed as: MANSFIELD SCOTT · MANSFIELD SCOTT M · MANSFIELD SCOTT MARSHALL
41 granted patents·1 pending application·3,014 citations·filing 1990–2016
98Inventor score
Files withIBM26GLOBALFOUNDRIES INC3INFINEON TECHNOLOGIES AG3UNIV LELAND STANFORD JUNIOR3GRAUR IOANA2
Top patents by PatentIndex Score
42 records- 0198US6553559B2Method to determine optical proximity correction and assist feature rules which account for variations in mask dimensionsIBM·Filed 2001·Granted Apr 22, 2003·296 cites·38 claims
- 0298US6421820B1Semiconductor device fabrication using a photomask with assist featuresINFINEON TECHNOLOGIES AG·Filed 1999·Granted Jul 16, 2002·293 cites·44 claims
- 0398US5125750AOptical recording system employing a solid immersion lensUNIV LELAND STANFORD JUNIOR·Filed 1991·Granted Jun 30, 1992·279 cites·10 claims
- 0498US5121256ALithography system employing a solid immersion lensUNIV LELAND STANFORD JUNIOR·Filed 1991·Granted Jun 9, 1992·911 cites·4 claims
- 0597US5965306AMethod of determining the printability of photomask defectsIBM·Filed 1997·Granted Oct 12, 1999·194 cites·52 claims
- 0697US5004307ANear field and solid immersion optical microscopeUNIV LELAND STANFORD JUNIOR·Filed 1990·Granted Apr 2, 1991·215 cites·6 claims
- 0796US8365108B2Generating cut mask for double-patterning processIBM·Filed 2011·Granted Jan 29, 2013·20 cites·24 claims
- 0896US7350183B2Method for improving optical proximity correctionIBM·Filed 2004·Granted Mar 25, 2008·245 cites·31 claims
- 0994US9252022B1Patterning assist feature to mitigate reactive ion etch microloading effectIBM·Filed 2014·Granted Feb 2, 2016·17 cites·19 claims
- 1094US6602728B1Method for generating a proximity model based on proximity rulesIBM·Filed 2001·Granted Aug 5, 2003·73 cites·13 claims
- 1193US6413683B1Method for incorporating sub resolution assist features in a photomask layoutIBM·Filed 2000·Granted Jul 2, 2002·52 cites·18 claims
- 1290US5932377AExact transmission balanced alternating phase-shifting mask for photolithographyIBM·Filed 1998·Granted Aug 3, 1999·86 cites·22 claims
- 1388US8392871B2Decomposition with multiple exposures in a process window based OPC flow using tolerance bandsMANSFIELD SCOTT M·Filed 2010·Granted Mar 5, 2013·7 cites·14 claims
- 1488US7650587B2Local coloring for hierarchical OPCIBM·Filed 2006·Granted Jan 19, 2010·10 cites·3 claims
- 1587US7503028B2Multilayer OPC for design aware manufacturingIBM·Filed 2006·Granted Mar 10, 2009·8 cites·3 claims
- 1687US6346979B1Process and apparatus to adjust exposure dose in lithography systemsIBM·Filed 1999·Granted Feb 12, 2002·68 cites·36 claims
- 1786US7266798B2Designer's intent tolerance bands for proximity correction and checkingIBM·Filed 2005·Granted Sep 4, 2007·15 cites·36 claims
- 1883US9910348B2Method of simultaneous lithography and etch correction flowGLOBALFOUNDRIES INC·Filed 2015·Granted Mar 6, 2018·4 cites·16 claims
- 1983US7343582B2Optical proximity correction using progressively smoothed mask shapesIBM·Filed 2005·Granted Mar 11, 2008·13 cites·21 claims
- 2083US6526164B1Intelligent photomask dispositionIBM·Filed 1999·Granted Feb 25, 2003·81 cites·27 claims
- 2182US7765021B2Method to check model accuracy during wafer patterning simulationIBM·Filed 2008·Granted Jul 27, 2010·7 cites·20 claims
- 2282US7565633B2Verifying mask layout printability using simulation with adjustable accuracyIBM·Filed 2007·Granted Jul 21, 2009·6 cites·3 claims
- 2381US8108804B2Short path customized mask correctionGRAUR IOANA·Filed 2009·Granted Jan 31, 2012·6 cites·13 claims
- 2481US6541166B2Method and apparatus for lithographically printing tightly nested and isolated device features using multiple mask exposuresIBM·Filed 2001·Granted Apr 1, 2003·19 cites·23 claims
- 2580US7607114B2Designer's intent tolerance bands for proximity correction and checkingIBM·Filed 2007·Granted Oct 20, 2009·9 cites·36 claims
- 2679US9471743B1Predicting process fail limitsGLOBALFOUNDRIES INC·Filed 2015·Granted Oct 18, 2016·3 cites·20 claims
- 2779US7945869B2Mask and method for patterning a semiconductor waferINFINEON TECHNOLOGIES AG·Filed 2007·Granted May 17, 2011·5 cites·26 claims
- 2879US7642020B2Method for separating optical and resist effects in process modelsIBM·Filed 2006·Granted Jan 5, 2010·5 cites·10 claims
- 2971US8214770B2Multilayer OPC for design aware manufacturingMUKHERJEE MAHARAJ·Filed 2009·Granted Jul 3, 2012·2 cites·35 claims
- 3069US8039203B2Integrated circuits and methods of design and manufacture thereofINFINEON TECHNOLOGIES AG·Filed 2008·Granted Oct 18, 2011·3 cites·26 claims
- 3166US8166423B2Photomask design verificationMANSFIELD SCOTT M·Filed 2009·Granted Apr 24, 2012·2 cites·20 claims
- 3265US7261981B2System and method of smoothing mask shapes for improved placement of sub-resolution assist featuresIBM·Filed 2004·Granted Aug 28, 2007·8 cites·17 claims
- 3362US8161422B2Fast and accurate method to simulate intermediate range flare effectsMUKHERJEE MAHARAJ·Filed 2009·Granted Apr 17, 2012·1 cites·18 claims
- 3461US5768017AOptical system for producing uniform line illuminationIBM·Filed 1996·Granted Jun 16, 1998·28 cites·12 claims
- 3560US8174681B2Calibration of lithographic process modelsGRAUR IOANA·Filed 2009·Granted May 8, 2012·1 cites·10 claims
- 3658US9087739B2Pattern improvement in multiprocess patterningDUNN DERREN N·Filed 2009·Granted Jul 21, 2015·1 cites·10 claims
- 3758US5757842AMethod and apparatus for compensating thermal lensing effects in a laser cavityIBM·Filed 1996·Granted May 26, 1998·21 cites·69 claims
- 3852US9034562B2Pattern improvement in multiprocess patterningIBM·Filed 2013·Granted May 19, 2015·0 cites·3 claims
- 3947US7895547B2Test pattern based process model calibrationIBM·Filed 2008·Granted Feb 22, 2011·0 cites·17 claims
- 4040US10516767B2Unifying realtime and static data for presenting over a web serviceGLOBALFOUNDRIES INC·Filed 2016·Granted Dec 24, 2019·0 cites·20 claims
- 4137US2005202326A1Optimized placement of sub-resolution assist features within two-dimensional environmentsIBM·Filed 2004·Application pending·0 cites
- 4235US7029830B2Precision and apertures for lithographic systemsIBM·Filed 2001·Granted Apr 18, 2006·0 cites·1 claims
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