Inventor · disambiguated record
Harald Woelfle
Also filed as: WOELFLE HARALD
7 granted patents·2 pending applications·3 citations·filing 2005–2017
76Inventor score
Top patents by PatentIndex Score
9 records- 0174US7911598B2Method for cleaning an EUV lithography device, method for measuring the residual gas atmosphere and the contamination and EUV lithography deviceZEISS CARL SMT AG·Filed 2009·Granted Mar 22, 2011·3 cites·30 claims
- 0259US2018031827A1Lens module comprising at least one exchangeable optical elementZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
- 0358US8939587B2Lens module comprising at least one exchangeable optical elementZEISS CARL SMT GMBH·Filed 2013·Granted Jan 27, 2015·0 cites·36 claims
- 0457US8376559B2Lens module comprising at least one exchangeable optical elementZEISS CARL SMT GMBH·Filed 2012·Granted Feb 19, 2013·0 cites·8 claims
- 0556US9703098B2Lens module comprising at least one exchangeable optical elementZEISS CARL SMT GMBH·Filed 2016·Granted Jul 11, 2017·0 cites·4 claims
- 0655US9551944B2Method for replacing objective partsZEISS CARL SMT GMBH·Filed 2014·Granted Jan 24, 2017·0 cites·20 claims
- 0753US9423695B2Lens module comprising at least one exchangeable optical elementZEISS CARL SMT GMBH·Filed 2015·Granted Aug 23, 2016·0 cites·26 claims
- 0848US2009260654A1Method and device for replacing objective partsZEISS CARL SMT AG·Filed 2009·Application pending·0 cites
- 0944US8092029B2Lens module comprising at least one exchangeable optical elementSOYEZ GUIDO·Filed 2005·Granted Jan 10, 2012·0 cites·37 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →