Inventor · disambiguated record
Naoko Asai
Also filed as: ASAI NAOKO
12 granted patents·183 citations·filing 1996–2005
93Inventor score
Top patents by PatentIndex Score
12 records- 0189US5733712AResist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formedHITACHI LTD·Filed 1996·Granted Mar 31, 1998·62 cites·109 claims
- 0286US6548312B1Manufacturing method of semiconductor integrated circuit devices and mask manufacturing methodsHITACHI LTD·Filed 2000·Granted Apr 15, 2003·31 cites·31 claims
- 0373US6255036B1Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formedHITACHI LTD·Filed 2000·Granted Jul 3, 2001·8 cites·10 claims
- 0470US6225011B1Method for manufacturing semiconductor devices utilizing plurality of exposure systemsHITACHI LTD·Filed 1999·Granted May 1, 2001·38 cites·10 claims
- 0565US7694526B2Shielding member and indoor unit of an air conditionerDAIKIN IND LTD·Filed 2005·Granted Apr 13, 2010·3 cites·12 claims
- 0663US6555295B1Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formedHITACHI LTD·Filed 2002·Granted Apr 29, 2003·4 cites·20 claims
- 0763US6461776B1Resist pattern forming method using anti-reflective layer, with variable extinction coefficientHITACHI LTD·Filed 2002·Granted Oct 8, 2002·4 cites·20 claims
- 0863US6355400B1Resist pattern forming method using anti-reflective layer, resist pattern formed, and method of etching using resist pattern and product formedHITACHI LTD·Filed 2001·Granted Mar 12, 2002·4 cites·7 claims
- 0955US5935765AResist pattern forming method using anti-reflective layer with variable extinction coefficientHITACHI LTD·Filed 1998·Granted Aug 10, 1999·10 cites·29 claims
- 1051US5846693AResist pattern forming method using anti-reflective layer with variable extinction coefficientHITACHI LTD·Filed 1998·Granted Dec 8, 1998·8 cites·19 claims
- 1149US6162588AResist pattern forming method using anti-reflective layer and method of etching using resist patternHITACHI LTD·Filed 1999·Granted Dec 19, 2000·7 cites·32 claims
- 1241US5985517AResist pattern forming method using anti-reflective layer resistHITACHI LTD·Filed 1999·Granted Nov 16, 1999·4 cites·14 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →