Inventor · disambiguated record
Kazuya Kiriyama
Also filed as: KIRIYAMA KAZUYA
5 granted patents·16 pending applications·7 citations·filing 2019–2025
67Inventor score
Top patents by PatentIndex Score
21 records- 0192US11592746B2Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acidJSR CORP·Filed 2020·Granted Feb 28, 2023·4 cites·13 claims
- 0291US11609495B2Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2020·Granted Mar 21, 2023·3 cites·18 claims
- 0369US2025116922A1Radiation-sensitive resin composition and method of forming resist patternJSR CORP·Filed 2024·Application pending·0 cites
- 0464US2023384676A1Radiation-sensitive resin composition, method of forming pattern, polymer, and compoundJSR CORP·Filed 2023·Application pending·0 cites
- 0562US2025004375A1Radiation-Sensitive Composition, Pattern Formation Method, and Photo-Degradable BaseJSR CORP·Filed 2024·Application pending·0 cites
- 0661US2023400767A1Radiation-sensitive resin composition, method of forming resist pattern, polymer, and compoundJSR CORP·Filed 2023·Application pending·0 cites
- 0761US2023407028A1Biaxially oriented polypropylene resin film, and packaging using sameTOYO BOSEKI·Filed 2021·Application pending·0 cites
- 0860US2022269172A1Radiation-sensitive resin composition, method of forming resist pattern, and polymerJSR CORP·Filed 2022·Application pending·0 cites
- 0959US12092957B2Radiation-sensitive resin composition, method for forming resist pattern and compoundJSR CORP·Filed 2021·Granted Sep 17, 2024·0 cites·19 claims
- 1058US11420430B2Polypropylene-based laminated filmTOYO BOSEKI·Filed 2019·Granted Aug 23, 2022·0 cites·10 claims
- 1156US11966161B2Radiation-sensitive resin composition, method of forming resist pattern, and compoundJSR CORP·Filed 2022·Granted Apr 23, 2024·0 cites·19 claims
- 1256US2023236501A1Radiation-sensitive resin composition, method of forming resist pattern, and compoundJSR CORP·Filed 2023·Application pending·0 cites
- 1356US2025334881A1Radiation sensitive resin composition, pattern forming method, radiation sensitive acid generator, and acid diffusion control agentJSR CORP·Filed 2023·Application pending·0 cites
- 1455US2023236506A2Radiation-sensitive resin composition and method of forming resist patternJSR CORP·Filed 2022·Application pending·0 cites
- 1554US2024385518A1Radiation-sensitive resin composition, resin, compound, and pattern formation methodJSR CORP·Filed 2022·Application pending·0 cites
- 1654US2022259390A1Biaxially oriented polypropylene-based resin film and package using sameTOYO BOSEKI·Filed 2020·Application pending·0 cites
- 1753US2022413385A1Radiation-sensitive resin composition and method of forming resist patternJSR CORP·Filed 2022·Application pending·0 cites
- 1851US2025237950A1Radiation-sensitive composition, method of forming resist pattern, and polymerJSR CORP·Filed 2025·Application pending·0 cites
- 1951US2022283498A1Radiation-sensitive resin composition and method for forming resist patternJSR CORP·Filed 2022·Application pending·0 cites
- 2048US2023104260A1Radiation-sensitive resin composition and method for forming resist patternJSR CORP·Filed 2021·Application pending·0 cites
- 2143US2022134717A1Polypropylene-based resin multilayer filmTOYO BOSEKI·Filed 2020·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →