Inventor · disambiguated record
Takuhiro Taniguchi
Also filed as: TANIGUCHI TAKUHIRO
5 granted patents·11 pending applications·7 citations·filing 2012–2023
66Inventor score
Top patents by PatentIndex Score
16 records- 0192US11592746B2Radiation-sensitive resin composition, resist pattern-forming method, compound and method of generating acidJSR CORP·Filed 2020·Granted Feb 28, 2023·4 cites·13 claims
- 0291US11609495B2Radiation-sensitive resin composition and resist pattern-forming methodJSR CORP·Filed 2020·Granted Mar 21, 2023·3 cites·18 claims
- 0360US2022269172A1Radiation-sensitive resin composition, method of forming resist pattern, and polymerJSR CORP·Filed 2022·Application pending·0 cites
- 0459US12092957B2Radiation-sensitive resin composition, method for forming resist pattern and compoundJSR CORP·Filed 2021·Granted Sep 17, 2024·0 cites·19 claims
- 0556US11966161B2Radiation-sensitive resin composition, method of forming resist pattern, and compoundJSR CORP·Filed 2022·Granted Apr 23, 2024·0 cites·19 claims
- 0656US2023236501A1Radiation-sensitive resin composition, method of forming resist pattern, and compoundJSR CORP·Filed 2023·Application pending·0 cites
- 0756US2025334881A1Radiation sensitive resin composition, pattern forming method, radiation sensitive acid generator, and acid diffusion control agentJSR CORP·Filed 2023·Application pending·0 cites
- 0855US2022177424A1Radiation-sensitive resin composition and method for forming resist patternJSR CORP·Filed 2022·Application pending·0 cites
- 0955US2023236506A2Radiation-sensitive resin composition and method of forming resist patternJSR CORP·Filed 2022·Application pending·0 cites
- 1055US2024319596A1Radiation-sensitive composition, resist pattern formation method, polymer, and compoundJSR CORP·Filed 2022·Application pending·0 cites
- 1154US2024385518A1Radiation-sensitive resin composition, resin, compound, and pattern formation methodJSR CORP·Filed 2022·Application pending·0 cites
- 1253US2022413385A1Radiation-sensitive resin composition and method of forming resist patternJSR CORP·Filed 2022·Application pending·0 cites
- 1351US2022283498A1Radiation-sensitive resin composition and method for forming resist patternJSR CORP·Filed 2022·Application pending·0 cites
- 1446US12158700B2Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated molded article, and semiconductor apparatusJSR CORP·Filed 2019·Granted Dec 3, 2024·0 cites·17 claims
- 1541US2021311391A1Photosensitive resin composition, method for forming resist pattern, method for manufacturing plated formed body, and semiconductor deviceJSR CORP·Filed 2019·Application pending·0 cites
- 1640US2014020761A1Organic dye material and dye-sensitized solar cell using sameWAKAMIYA ATSUSHI·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →