Inventor · disambiguated record
Yoshimi Igarashi
Also filed as: IGARASHI YOSHIMI
7 granted patents·1 pending application·15 citations·filing 2012–2018
77Inventor score
Files withHITACHI CHEMICAL CO LTD8
Top patents by PatentIndex Score
8 records- 0195US9052587B2Conductive pattern formation method, conductive pattern-bearing substrate, and touch panel sensorHITACHI CHEMICAL CO LTD·Filed 2012·Granted Jun 9, 2015·14 cites·24 claims
- 0277US9964849B2Method for forming resin cured film pattern, photosensitive resin composition, photosensitive element, method for producing touch panel, and resin cured filmHITACHI CHEMICAL CO LTD·Filed 2017·Granted May 8, 2018·1 cites·8 claims
- 0363US10663861B2Method for forming resin cured film pattern, photosensitive resin composition, photosensitive element, method for producing touch panel, and resin cured filmHITACHI CHEMICAL CO LTD·Filed 2018·Granted May 26, 2020·0 cites·29 claims
- 0458US9817499B2Conductive pattern formation method, conductive pattern-bearing substrate, and touch panel sensorHITACHI CHEMICAL CO LTD·Filed 2016·Granted Nov 14, 2017·0 cites·13 claims
- 0557US10386719B2Method for forming resin cured film pattern, photosensitive resin composition, photosensitive element, method for producing touch panel, and resin cured filmHITACHI CHEMICAL CO LTD·Filed 2016·Granted Aug 20, 2019·0 cites·8 claims
- 0656US9639189B2Conductive pattern formation method, conductive pattern-bearing substrate, and touch panel sensorHITACHI CHEMICAL CO LTD·Filed 2015·Granted May 2, 2017·0 cites·18 claims
- 0753US9348223B2Method for forming resin cured film pattern, photosensitive resin composition, photosensitive element, method for producing touch panel, and resin cured filmHITACHI CHEMICAL CO LTD·Filed 2012·Granted May 24, 2016·0 cites·19 claims
- 0844US2014335350A1Method for forming protective film on electrode for touch panel, photosensitive resin composition and photosensitive element, and method for manufacturing touch panelHITACHI CHEMICAL CO LTD·Filed 2012·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →