Inventor · disambiguated record
Fu-Yang Yu
Also filed as: YU FU-YANG
10 granted patents·141 citations·filing 1994–2002
88Inventor score
Files withUNITED MICROELECTRONICS CORP10
Top patents by PatentIndex Score
10 records- 0191US6120366AChemical-mechanical polishing padUNITED MICROELECTRONICS CORP·Filed 1999·Granted Sep 19, 2000·99 cites·10 claims
- 0258US6648729B2Wafer pressure regulation system for polishing machineUNITED MICROELECTRONICS CORP·Filed 2002·Granted Nov 18, 2003·8 cites·9 claims
- 0356US6352244B2Auxiliary gasline-heating unit in chemical vapor depositionUNITED MICROELECTRONICS CORP·Filed 2001·Granted Mar 5, 2002·2 cites·2 claims
- 0456US6322057B1Auxiliary gasline-heating unit in chemical vapor depositionUNITED MICROELECTRONICS CORP·Filed 2000·Granted Nov 27, 2001·2 cites·1 claims
- 0551US6129043AGas tube with heating apparatusUNITED MICROELECTRONICS CORP·Filed 1999·Granted Oct 10, 2000·14 cites·13 claims
- 0645US6676801B2Pressure suppression device for chemical mechanical polishing machine and method thereofUNITED MICROELECTRONICS CORP·Filed 2001·Granted Jan 13, 2004·1 cites·16 claims
- 0736US6228420B1Method to maintain consistent thickness of thin film deposited by chemical vapor depositionUNITED MICROELECTRONICS CORP·Filed 1999·Granted May 8, 2001·6 cites·5 claims
- 0833US5604152ACVD process for deposition of amorphous siliconUNITED MICROELECTRONICS CORP·Filed 1994·Granted Feb 18, 1997·5 cites·20 claims
- 0929US6307163B1Chemical mixer tank calibrator and calibrating method for the sameUNITED MICROELECTRONICS CORP·Filed 1999·Granted Oct 23, 2001·2 cites·7 claims
- 1029US6165255AChemical-liquid controlling apparatusUNITED MICROELECTRONICS CORP·Filed 1999·Granted Dec 26, 2000·2 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →