Inventor · disambiguated record
Renzo Capelli
Also filed as: CAPELLI RENZO
12 granted patents·6 pending applications·2 citations·filing 2015–2025
80Inventor score
Files withZEISS CARL SMT GMBH18
Top patents by PatentIndex Score
18 records- 0180US2025060677A1Method for measuring an effect of a wavelength-dependent measuring light reflectivity and an effect of a polarization of measuring light on a measuring light impingement on a lithography maskZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0272US12174546B2Method for measuring an effect of a wavelength-dependent measuring light reflectivity and an effect of a polarization of measuring light on a measuring light impingement on a lithography maskZEISS CARL SMT GMBH·Filed 2022·Granted Dec 24, 2024·0 cites·20 claims
- 0371US2025314602A1Method for qualifying a defect structure on an object utilizable in projection lithographyZEISS CARL SMT GMBH·Filed 2025·Application pending·0 cites
- 0469US10055833B2Method and system for EUV mask blank buried defect analysisZEISS CARL SMT GMBH·Filed 2015·Granted Aug 21, 2018·2 cites·24 claims
- 0566US11796926B2Metrology system for examining objects with EUV measurement lightZEISS CARL SMT GMBH·Filed 2022·Granted Oct 24, 2023·0 cites·20 claims
- 0664US11774848B2Method and apparatus for repairing defects of a photolithographic mask for the EUV rangeZEISS CARL SMT GMBH·Filed 2021·Granted Oct 3, 2023·0 cites·23 claims
- 0763US2024361704A1Method for simulating illumination and imaging properties of an optical production system during the illumination and imaging of an object by means of an optical measurement systemZEISS CARL SMT GMBH·Filed 2024·Application pending·0 cites
- 0859US12422743B2Method for measuring a reflectivity of an object for measurement light and metrology system for carrying out the methodZEISS CARL SMT GMBH·Filed 2022·Granted Sep 23, 2025·0 cites·18 claims
- 0957US12288272B2Method for determining a production aerial image of an object to be measuredZEISS CARL SMT GMBH·Filed 2021·Granted Apr 29, 2025·0 cites·20 claims
- 1057US2023020107A1System and method for inspecting a mask for euv lithographyZEISS CARL SMT GMBH·Filed 2022·Application pending·0 cites
- 1154US2024085779A1Method and apparatus for qualifying a mask for use in lithographyZEISS CARL SMT GMBH·Filed 2023·Application pending·0 cites
- 1253US12372431B2Method for determining an imaging quality of an optical system when illuminated by illumination light within a pupil to be measuredZEISS CARL SMT GMBH·Filed 2022·Granted Jul 29, 2025·0 cites·26 claims
- 1351US11079673B2Method and apparatus for repairing defects of a photolithographic mask for the EUV rangeZEISS CARL SMT GMBH·Filed 2018·Granted Aug 3, 2021·0 cites·30 claims
- 1450US10564551B2Method for determining a focus position of a lithography mask and metrology system for carrying out such a methodZEISS CARL SMT GMBH·Filed 2019·Granted Feb 18, 2020·0 cites·19 claims
- 1546US10481505B2Method for determining an imaging aberration contribution of an imaging optical unit for measuring lithography masksZEISS CARL SMT GMBH·Filed 2019·Granted Nov 19, 2019·0 cites·20 claims
- 1645US11061331B2Method for determining a structure-independent contribution of a lithography mask to a fluctuation of the linewidthZEISS CARL SMT GMBH·Filed 2019·Granted Jul 13, 2021·0 cites·10 claims
- 1745US10775691B2Method for examining photolithographic masks and mask metrology apparatus for performing the methodZEISS CARL SMT GMBH·Filed 2018·Granted Sep 15, 2020·0 cites·20 claims
- 1832US2017176851A1Method for producing a mask for the extreme ultraviolet wavelength range, mask and deviceZEISS CARL SMT GMBH·Filed 2017·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →