Inventor · disambiguated record
Kazuto Matsuki
Also filed as: MATSUKI KAZUTO
11 granted patents·3 pending applications·151 citations·filing 1997–2023
90Inventor score
Files withTOSHIBA KK7TOSHIBA MEMORY CORP3ADVANCED MASK INSPECTION TECH1EKO INSTR CO LTD1KASA KENTARO1
Top patents by PatentIndex Score
14 records- 0186US6313476B1Charged beam lithography systemTOSHIBA KK·Filed 1999·Granted Nov 6, 2001·56 cites·12 claims
- 0278US9960007B2Electron beam irradiation deviceTOSHIBA MEMORY CORP·Filed 2016·Granted May 1, 2018·3 cites·19 claims
- 0374US7539222B2Method of operating laser light sourceADVANCED MASK INSPECTION TECH·Filed 2006·Granted May 26, 2009·4 cites·5 claims
- 0470US5760410AElectron beam lithography apparatus and methodTOSHIBA KK·Filed 1997·Granted Jun 2, 1998·22 cites·38 claims
- 0569US5912468ACharged particle beam exposure systemTOSHIBA KK·Filed 1997·Granted Jun 15, 1999·22 cites·10 claims
- 0664US5894057ACharged beam drawing methodTOSHIBA KK·Filed 1997·Granted Apr 13, 1999·17 cites·9 claims
- 0752US2025334699A1Lidar light-receiving device, lidar, and meteorological observation lidarEKO INSTR CO LTD·Filed 2023·Application pending·0 cites
- 0851US6319642B1Electron beam exposure apparatusTOSHIBA KK·Filed 1999·Granted Nov 20, 2001·13 cites·6 claims
- 0950US7359043B2Pattern inspecting method and pattern inspecting apparatusTOSHIBA KK·Filed 2003·Granted Apr 15, 2008·4 cites·17 claims
- 1046US6182369B1Pattern forming apparatusTOSHIBA KK·Filed 1998·Granted Feb 6, 2001·10 cites·6 claims
- 1143US10018915B2Pattern forming methodTOSHIBA MEMORY CORP·Filed 2016·Granted Jul 10, 2018·0 cites·20 claims
- 1242US9188879B2Substrate holding apparatus, pattern transfer apparatus, and pattern transfer methodKASA KENTARO·Filed 2012·Granted Nov 17, 2015·0 cites·20 claims
- 1338US2019287794A1Template, method of fabricating template, and method of manufacturing semiconductor deviceTOSHIBA MEMORY CORP·Filed 2018·Application pending·0 cites
- 1436US2012081538A1Pattern inspection apparatusOGAWA RIKI·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →