Inventor · disambiguated record
Vincent M. Omarjee
Also filed as: OMARJEE VINCENT · OMARJEE VINCENT M
18 granted patents·13 pending applications·45 citations·filing 2009–2020
91Inventor score
Files withDUSSARRAT CHRISTIAN13AIR LIQUIDE AMERICAN8AIR LIQUIDE4L AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE2FEIST BENJAMIN J1
Top patents by PatentIndex Score
31 records- 0194US9514959B2Fluorocarbon molecules for high aspect ratio oxide etchAIR LIQUIDE·Filed 2013·Granted Dec 6, 2016·14 cites·20 claims
- 0293US11430663B2Iodine-containing compounds for etching semiconductor structuresAIR LIQUIDE AMERICAN·Filed 2020·Granted Aug 30, 2022·3 cites·18 claims
- 0387US8343860B1High C content molecules for C implantAIR LIQUIDE·Filed 2011·Granted Jan 1, 2013·8 cites·9 claims
- 0486US10607850B2Iodine-containing compounds for etching semiconductor structuresAIR LIQUIDE AMERICAN·Filed 2016·Granted Mar 31, 2020·4 cites·19 claims
- 0584US9892932B2Chemistries for TSV/MEMS/power device etchingAIR LIQUIDE AMERICAN·Filed 2015·Granted Feb 13, 2018·3 cites·14 claims
- 0683US8367531B1Aluminum implant using new compoundsAIR LIQUIDE·Filed 2011·Granted Feb 5, 2013·5 cites·9 claims
- 0781US10103031B2Chemistries for TSV/MEMS/power device etchingAIR LIQUIDE AMERICAN·Filed 2017·Granted Oct 16, 2018·2 cites·18 claims
- 0876US11152223B2Fluorocarbon molecules for high aspect ratio oxide etchAIR LIQUIDE AMERICAN·Filed 2019·Granted Oct 19, 2021·1 cites·18 claims
- 0972US9045509B2Hafnium- and zirconium-containing precursors and methods of using the sameDUSSARRAT CHRISTIAN·Filed 2010·Granted Jun 2, 2015·1 cites·13 claims
- 1070US8765220B2Methods of making and deposition methods using hafnium- or zirconium-containing compoundsDUSSARRAT CHRISTIAN·Filed 2010·Granted Jul 1, 2014·2 cites·20 claims
- 1162US8349738B2Metal precursors for deposition of metal-containing filmsAIR LIQUIDE·Filed 2011·Granted Jan 8, 2013·1 cites·16 claims
- 1260US10720335B2Chemistries for TSV/MEMS/power device etchingAIR LIQUIDE AMERICAN·Filed 2018·Granted Jul 21, 2020·0 cites·17 claims
- 1360US9064694B2Nitridation of atomic layer deposited high-k dielectrics using trisilylamineTOKYO ELECTRON LTD·Filed 2013·Granted Jun 23, 2015·1 cites·16 claims
- 1459US2010034719A1Novel lanthanide beta-diketonate precursors for lanthanide thin film depositionDUSSARRAT CHRISTIAN·Filed 2009·Application pending·0 cites
- 1557US10381240B2Fluorocarbon molecules for high aspect ratio oxide etchAIR LIQUIDE AMERICAN·Filed 2016·Granted Aug 13, 2019·0 cites·12 claims
- 1650US2013089681A1Plasma-enhanced deposition of titanium-containing films for various applications using amidinate titanium precursorsDUSSARRAT CHRISTIAN·Filed 2011·Application pending·0 cites
- 1750US2013089680A1Plasma-enhanced deposition of ruthenium-containing films for various applications using amidinate ruthenium precursorsDUSSARRAT CHRISTIAN·Filed 2011·Application pending·0 cites
- 1850US2013089679A1Plasma-enhanced deposition of manganese-containing films for various applications using amidinate manganese precursorsDUSSARRAT CHRISTIAN·Filed 2011·Application pending·0 cites
- 1950US2013084407A1Plasma-enhanced deposition of copper-containing films for various applications using amidinate copper precursorsDUSSARRAT CHRISTIAN·Filed 2011·Application pending·0 cites
- 2050US2013089678A1Plasma-enhanced deposition of nickel-containing films for various applications using amidinate nickel precursorsDUSSARRAT CHRISTIAN·Filed 2011·Application pending·0 cites
- 2149US9121093B2Bis-ketoiminate copper precursors for deposition of copper-containing films and methods thereofDUSSARRAT CHRISTIAN·Filed 2010·Granted Sep 1, 2015·0 cites·10 claims
- 2249US8852460B2Alkali earth metal precursors for depositing calcium and strontium containing filmsLETESSIER OLIVIER·Filed 2009·Granted Oct 7, 2014·0 cites·9 claims
- 2349US2013202794A1Metal film depositionDUSSARRAT CHRISTIAN·Filed 2011·Application pending·0 cites
- 2446US8076243B2Metal precursors for deposition of metal-containing filmsDUSSARRAT CHRISTIAN·Filed 2010·Granted Dec 13, 2011·0 cites·5 claims
- 2544US2014322924A1Silicon containing compounds for ald deposition of metal silicate filmsL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2014·Application pending·0 cites
- 2642US2016046408A1Internally coated vessel for housing a metal halideL AIR LIQUIDE SOCIÉTÉ ANONYME POUR L ETUDE ET L EXPL DES PROCÉDÉS GEORGES CLAUDE·Filed 2015·Application pending·0 cites
- 2739US2010003532A1Beta-diketiminate precursors for metal containing film depositionFEIST BENJAMIN J·Filed 2009·Application pending·0 cites
- 2839US2013109198A1High carbon content molecules for amorphous carbon depositionDUSSARRAT CHRISTIAN·Filed 2011·Application pending·0 cites
- 2937US2012227762A1Plasma ashing compounds and methods of useDUSSARRAT CHRISTIAN·Filed 2010·Application pending·0 cites
- 3037US2013022745A1Silane blend for thin film vapor depositionAIR LIQUIDE AMERICAN·Filed 2010·Application pending·0 cites
- 3135US11679156B2Use of stable isotopes to prove authentication of manufacturing locationJACKSIER TRACEY·Filed 2018·Granted Jun 20, 2023·0 cites·19 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →