Inventor · disambiguated record
Adam S. Hock
Also filed as: HOCK ADAM · HOCK ADAM S
12 granted patents·1 pending application·102 citations·filing 2006–2022
90Inventor score
Files withUCHICAGO ARGONNE LLC7MASSACHUSETTS INST TECHNOLOGY4GORDON ROY G1ILLINOIS INSTITUTE OF TECH1
Top patents by PatentIndex Score
13 records- 0197US7932397B2Olefin metathesis catalysts and related methodsMASSACHUSETTS INST TECHNOLOGY·Filed 2006·Granted Apr 26, 2011·49 cites·25 claims
- 0295US8350073B2Olefin metathesis catalysts and related methodsMASSACHUSETTS INST TECHNOLOGY·Filed 2011·Granted Jan 8, 2013·13 cites·13 claims
- 0394US8829219B2Olefin metathesis catalysts and related methodsMASSACHUSETTS INST TECHNOLOGY·Filed 2013·Granted Sep 9, 2014·11 cites·10 claims
- 0492US10640435B2Multimetallic catalystsUCHICAGO ARGONNE LLC·Filed 2016·Granted May 5, 2020·6 cites·9 claims
- 0591US8796483B2Cyclic metal amides and vapor deposition using themGORDON ROY G·Filed 2011·Granted Aug 5, 2014·12 cites·22 claims
- 0686US9242240B2Olefin metathesis catalysts and related methodsMASSACHUSETTS INST TECHNOLOGY·Filed 2014·Granted Jan 26, 2016·2 cites·32 claims
- 0785US10472303B2Alkane activation with single and bi-metallic catalystsUCHICAGO ARGONNE LLC·Filed 2017·Granted Nov 12, 2019·2 cites·11 claims
- 0885US9192919B2Selective alkane activation with single-site atoms on amorphous supportUCHICAGO ARGONNE LLC·Filed 2013·Granted Nov 24, 2015·6 cites·9 claims
- 0975US9382618B2Oxygen-free atomic layer deposition of indium sulfideUCHICAGO ARGONNE LLC·Filed 2014·Granted Jul 5, 2016·1 cites·14 claims
- 1071US11034627B2Alkane activation with single and bimetallic catalystsUCHICAGO ARGONNE LLC·Filed 2019·Granted Jun 15, 2021·0 cites·7 claims
- 1162US2024209503A1Selective hydration by site selective atomic layer depositionUCHICAGO ARGONNE LLC·Filed 2022·Application pending·0 cites
- 1259US11141714B2Selective alkane activation with single-site atoms on amorphous supportUCHICAGO ARGONNE LLC·Filed 2015·Granted Oct 12, 2021·0 cites·9 claims
- 1341US12435415B2Thermal atomic layer deposition of ternary gallium oxide thin filmsILLINOIS INSTITUTE OF TECH·Filed 2021·Granted Oct 7, 2025·0 cites·22 claims
Join the waitlist — get patent alerts
Get an alert when Adam S. Hock files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →