Inventor · disambiguated record
Sumito Shimizu
Also filed as: SHIMIZU SUMITO
8 granted patents·3 pending applications·108 citations·filing 1997–2014
85Inventor score
Top patents by PatentIndex Score
11 records- 0188US6440615B1Method of repairing a mask with high electron scattering and low electron absorption propertiesNIKON CORP·Filed 2000·Granted Aug 27, 2002·38 cites·19 claims
- 0275US6108096ALight absorption measurement apparatus and methodsNIKON CORP·Filed 1998·Granted Aug 22, 2000·43 cites·38 claims
- 0370US9431555B2Solar cell and method for manufacturing sameSANYO ELECTRIC CO·Filed 2014·Granted Aug 30, 2016·1 cites·5 claims
- 0463US9508888B2Solar cell with silicon nitride layer and method for manufacturing samePANASONIC IP MAN CO LTD·Filed 2014·Granted Nov 29, 2016·1 cites·5 claims
- 0560US6972417B2Apparatus and methods for patterning a reticle blank by electron-beam inscription with reduced exposure of the reticle blank by backscattered electronsNIKON CORP·Filed 2001·Granted Dec 6, 2005·7 cites·17 claims
- 0651US6734515B1Semiconductor light receiving elementMITSUBISHI CABLE IND LTD·Filed 1999·Granted May 11, 2004·17 cites·6 claims
- 0740US2002024011A1Method for correcting opaque defects in reticles for charged-particle-beam microlithography, and reticles produced using sameNIKON CORP·Filed 2001·Application pending·0 cites
- 0840US2002053353A1Methods and apparatus for cleaning an object using an electron beam, and device-fabrication apparatus comprising sameFiled 2001·Application pending·0 cites
- 0937US6756182B2Charged-particle-beam microlithography methods exhibiting reduced coulomb effectsNIKON CORP·Filed 2002·Granted Jun 29, 2004·0 cites·28 claims
- 1034US2003044697A1Methods and apparatus for correcting the proximity effect in a charged-particle-beam microlithography system and devices manufactured from the sameNIKON CORP·Filed 2002·Application pending·0 cites
- 1128US6074513AEtching apparatus and method for manufacturing optical devicesNIKON CORP·Filed 1997·Granted Jun 13, 2000·1 cites·18 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →