Inventor · disambiguated record
Olaf Schmidt-Park
Also filed as: SCHMIDT-PARK OLAF
11 granted patents·141 citations·filing 1997–2014
92Inventor score
Top patents by PatentIndex Score
11 records- 0197US8883250B2Methods of rejuvenating sputtering targetsSTARCK H C INC·Filed 2013·Granted Nov 11, 2014·13 cites·15 claims
- 0296US8491959B2Methods of rejuvenating sputtering targetsMILLER STEVEN A·Filed 2012·Granted Jul 23, 2013·14 cites·15 claims
- 0396US8197894B2Methods of forming sputtering targetsMILLER STEVEN A·Filed 2007·Granted Jun 12, 2012·23 cites·15 claims
- 0493US9783882B2Fine grained, non banded, refractory metal sputtering targets with a uniformly random crystallographic orientation, method for making such film, and thin film based devices and products made therefromSTARCK H C INC·Filed 2014·Granted Oct 10, 2017·5 cites·24 claims
- 0578US5797988AProcess for producing briquetted and pressed granular material and use thereofBAYER AG·Filed 1997·Granted Aug 25, 1998·23 cites·19 claims
- 0674US6241167B1Process for producing briquetted and pressed granular material and use thereofBAYER AG·Filed 2000·Granted Jun 5, 2001·8 cites·23 claims
- 0767US5961710AInorganic pigment granules process for their production and their useBAYER AG·Filed 1998·Granted Oct 5, 1999·26 cites·7 claims
- 0861US6079644AProcess for producing briquetted and pressed granular material and use thereofBAYER AG·Filed 1997·Granted Jun 27, 2000·10 cites·23 claims
- 0958US6364223B2Process for producing briquetted and pressed granular material and use thereofBAYER AG·Filed 2001·Granted Apr 2, 2002·1 cites·15 claims
- 1052US6432196B1Process for producing briquetted and pressed granular material and use thereofBAYER AG·Filed 1999·Granted Aug 13, 2002·8 cites·19 claims
- 1134US5899566AReactor for corrosive reaction mixturesBAYER AG·Filed 1997·Granted May 4, 1999·10 cites·9 claims
Join the waitlist — get patent alerts
Get an alert when Olaf Schmidt-Park files or is granted a new patent.
We store only your email — no account needed. See our privacy policy.
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →