Inventor · disambiguated record
Andre Schreuder
Also filed as: SCHREUDER ANDRE · SCHREUDER ANDRÉ
8 granted patents·3 pending applications·13 citations·filing 2005–2025
79Inventor score
Files withASML NETHERLANDS BV8COSIJNS SUZANNE JOHANNA ANTONETTA GEERTRUDA1JANSEN MAARTEN JOZEF1LOOPSTRA ERIK ROELOF1
Top patents by PatentIndex Score
11 records- 0180US8937707B2Lithographic apparatus, device manufacturing method, and method of calibrating a displacement measuring systemJANSEN MAARTEN JOZEF·Filed 2012·Granted Jan 20, 2015·4 cites·20 claims
- 0272US11664264B2Lithographic apparatus, method for unloading a substrate and method for loading a substrateASML NETHERLANDS BV·Filed 2016·Granted May 30, 2023·2 cites·24 claims
- 0370US7417710B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Granted Aug 26, 2008·3 cites·23 claims
- 0464US2023260820A1Lithographic apparatus, method for unloading a substrate and method for loading a substrateASML NETHERLANDS BV·Filed 2023·Application pending·0 cites
- 0563US8111377B2Lithographic apparatus with an encoder arranged for defining a zero levelCOSIJNS SUZANNE JOHANNA ANTONETTA GEERTRUDA·Filed 2009·Granted Feb 7, 2012·3 cites·19 claims
- 0657US8289498B2Lithographic apparatus and device manufacturing methodLOOPSTRA ERIK ROELOF·Filed 2009·Granted Oct 16, 2012·1 cites·8 claims
- 0754US2025157849A1Substrate holder for use in lithographic apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2025·Application pending·0 cites
- 0847US12243768B2Substrate holder for use in a lithographic apparatus and a device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Mar 4, 2025·0 cites·20 claims
- 0945US12386273B2Substrate holder, lithographic apparatus and methodASML NETHERLANDS BV·Filed 2020·Granted Aug 12, 2025·0 cites·20 claims
- 1042US11556064B2Stage apparatus and method for calibrating an object loading processASML NETHERLANDS BV·Filed 2019·Granted Jan 17, 2023·0 cites·18 claims
- 1137US2020103770A1A system for cleaning a substrate support, a method of removing matter from a substrate support, and a lithographic apparatusASML NETHERLANDS BV·Filed 2018·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →