Inventor · disambiguated record
Kazuhiko Takase
Also filed as: TAKASE KAZUHIKO
8 granted patents·3 pending applications·155 citations·filing 1995–2010
86Inventor score
Top patents by PatentIndex Score
11 records- 0184US5810940AMethod for cleaning semiconductor wafersTOSHIBA KK·Filed 1996·Granted Sep 22, 1998·81 cites·28 claims
- 0271US7632358B2Cleaning method and a cleaning device for cleaning an edge portion and back face of a waferTOSHIBA KK·Filed 2006·Granted Dec 15, 2009·3 cites·10 claims
- 0365US7700490B2Semiconductor manufacturing method for removing residue generated by dry etchingTOSHIBA KK·Filed 2007·Granted Apr 20, 2010·2 cites·4 claims
- 0463US6152153ASubstrate cleaning/drying equipment and substrate cleaning/drying methodTOSHIBA KK·Filed 1998·Granted Nov 28, 2000·28 cites·13 claims
- 0560US5744402AMethod of manufacturing semiconductor devicesTOSHIBA KK·Filed 1995·Granted Apr 28, 1998·26 cites·23 claims
- 0655US2010051073A1Cleaning method and a cleaning device for cleaning an edge portion and back face of a waferTOSHIBA KK·Filed 2009·Application pending·0 cites
- 0745US2008188085A1Post-dry etching cleaning liquid composition and process for fabricating semiconductor deviceMURAMATSU MASAFUMI·Filed 2008·Application pending·0 cites
- 0843US7776754B2Semiconductor device manufacturing method and chemical fluid used for manufacturing semiconductor deviceTOSHIBA KK·Filed 2006·Granted Aug 17, 2010·0 cites·6 claims
- 0941US8513140B2Post-dry etching cleaning liquid composition and process for fabricating semiconductor deviceMURAMATSU MASAFUMI·Filed 2010·Granted Aug 20, 2013·0 cites·11 claims
- 1040US6289473B1Semiconductor device having a debug functionMITSUBISHI ELECTRIC CORP·Filed 1998·Granted Sep 11, 2001·15 cites·7 claims
- 1140US2006019201A1Post-dry etching cleaning liquid composition and process for fabricating semiconductor deviceMURAMATSU MASAFUMI·Filed 2005·Application pending·0 cites
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