Inventor · disambiguated record
Hendrikus Robertus Marie Van Greevenbroek
Also filed as: VAN GREEVENBROEK HENDRIKUS R M · VAN GREEVENBROEK HENDRIKUS ROB · VAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE
18 granted patents·6 pending applications·149 citations·filing 2001–2018
92Inventor score
Files withASML NETHERLANDS BV14DIERICHS MARCEL MATHIJS THEODORE MARIE2ZEISS CARL SMT AG2ASML HOLDING NV1MULDER HEINE MELLE1
Top patents by PatentIndex Score
24 records- 0194US7375799B2Lithographic apparatusASML NETHERLANDS BV·Filed 2005·Granted May 20, 2008·24 cites·15 claims
- 0291US7038763B2Kit of parts for assembling an optical element, method of assembling an optical element, optical element, lithographic apparatus, and device manufacturing methodASML NETHERLANDS BV·Filed 2003·Granted May 2, 2006·65 cites·20 claims
- 0389US8629973B2Lithographic apparatus and method for illumination uniformity correction and uniformity drift compensationZIMMERMAN RICHARD CARL·Filed 2010·Granted Jan 14, 2014·13 cites·20 claims
- 0484US9442380B2Method and apparatus for generating radiationASML NETHERLANDS BV·Filed 2013·Granted Sep 13, 2016·4 cites·15 claims
- 0580US7697116B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2006·Granted Apr 13, 2010·4 cites·16 claims
- 0676US7170587B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2004·Granted Jan 30, 2007·11 cites·20 claims
- 0775US7525641B2System and method for uniformity correctionASML HOLDING NV·Filed 2005·Granted Apr 28, 2009·6 cites·11 claims
- 0875US6710856B2Method of operating a lithographic apparatus, lithographic apparatus, method of manufacturing a device, and device manufactured therebyASML NETHERLANDS BV·Filed 2001·Granted Mar 23, 2004·17 cites·26 claims
- 0972US8937706B2Lithographic apparatus and methodMULDER HEINE MELLE·Filed 2007·Granted Jan 20, 2015·3 cites·24 claims
- 1062US8441611B2Lithographic apparatus and methodVAN GREEVENBROEK HENDRIKUS ROBERTUS MARIE·Filed 2008·Granted May 14, 2013·2 cites·23 claims
- 1161US10222703B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2017·Granted Mar 5, 2019·0 cites·20 claims
- 1257US9778575B2Lithographic apparatus and methodASML NETHERLANDS BV·Filed 2016·Granted Oct 3, 2017·0 cites·22 claims
- 1357US9170498B2Lithographic apparatus and a method for determining a polarization property of a projection system using an adjustable polarizer and interferometric sensorASML NETHERLANDS BV·Filed 2013·Granted Oct 27, 2015·0 cites·12 claims
- 1452US11366399B2Laser beam monitoring systemASML NETHERLANDS BV·Filed 2018·Granted Jun 21, 2022·0 cites·22 claims
- 1552US8279405B2Lithographic apparatus and device manufacturing methodDIERICHS MARCEL MATHIJS THEODORE MARIE·Filed 2010·Granted Oct 2, 2012·0 cites·11 claims
- 1650US2006203221A1Lithographic apparatus and a method for determining a polarization propertyASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 1748US7952685B2Illuminator for a lithographic apparatus and methodZEISS CARL SMT AG·Filed 2007·Granted May 31, 2011·0 cites·24 claims
- 1840US7872731B2Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2007·Granted Jan 18, 2011·0 cites·21 claims
- 1940US2007058151A1Optical element for use in lithography apparatus and method of conditioning radiation beamZEISS CARL SMT AG·Filed 2005·Application pending·0 cites
- 2040US2013077073A1Methods to control euv exposure dose and euv lithographic methods and apparatus using such methodsVAN SCHOOT JAN BERNARD PLECHELMUS·Filed 2012·Application pending·0 cites
- 2139US9188881B2Lithographic apparatus and method for reducing stray radiationDIERICHS MARCEL MATHIJS THEODORE MARIE·Filed 2010·Granted Nov 17, 2015·0 cites·14 claims
- 2239US2010118288A1Lithographic projection system and projection lens polarization sensorVAN DE KERKHOF MARCUS ADRIANUS·Filed 2006·Application pending·0 cites
- 2339US2010182582A1Passive reticle tool, a lithographic apparatus and a method of patterning a device in a lithography toolASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
- 2439US2010045956A1Lithographic Apparatus, Method for Determining at Least One Polarization Property Thereof, Polarization Analyzer and Polarization Sensor ThereofASML NETHERLANDS BV·Filed 2006·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →