Inventor · disambiguated record
Shuzo Fujimura
Also filed as: FUJIMURA SHUZO
42 granted patents·2,232 citations·filing 1980–2000
99Inventor score
Top patents by PatentIndex Score
42 records- 0198US5961775AApparatus for removing organic resist from semiconductorFUJITSU LTD·Filed 1997·Granted Oct 5, 1999·483 cites·14 claims
- 0298US4609428AMethod and apparatus for microwave plasma anisotropic dry etchingFUJITSU LTD·Filed 1985·Granted Sep 2, 1986·119 cites·24 claims
- 0395US5478403AProcess and apparatus for ashing treatmentFUJITSU LTD·Filed 1994·Granted Dec 26, 1995·246 cites·14 claims
- 0491US4718976AProcess and apparatus for plasma treatmentFUJITSU LTD·Filed 1986·Granted Jan 12, 1988·70 cites·16 claims
- 0591US4512868AMicrowave plasma processing apparatusFUJITSU LTD·Filed 1984·Granted Apr 23, 1985·81 cites·8 claims
- 0688US5773201AMethod of stripping a resist maskFUJITSU LTD·Filed 1994·Granted Jun 30, 1998·49 cites·19 claims
- 0786US5024748AMicrowave plasma processing apparatusFUJITSU LTD·Filed 1990·Granted Jun 18, 1991·65 cites·8 claims
- 0886US4938839AMethod of removing photoresist on a semiconductor waferFUJITSU LTD·Filed 1988·Granted Jul 3, 1990·50 cites·7 claims
- 0985US4961820AAshing method for removing an organic film on a substance of a semiconductor device under fabricationFUJITSU LTD·Filed 1989·Granted Oct 9, 1990·64 cites·7 claims
- 1083US6579465B1Plasma surface treatment method and resulting deviceANNEAL CORP·Filed 2000·Granted Jun 17, 2003·28 cites·21 claims
- 1183US4987284ADownstream microwave plasma processing apparatus having an improved coupling structure between microwave plasmaFUJITSU LTD·Filed 1990·Granted Jan 22, 1991·52 cites·12 claims
- 1282US4393807ASpinnerFUJITSU LTD·Filed 1980·Granted Jul 19, 1983·46 cites·6 claims
- 1379US6007671AMethod for hydrogen plasma down-flow processing and apparatus thereofFUJITSU LTD·Filed 1996·Granted Dec 28, 1999·32 cites·40 claims
- 1479US4861424AAshing process of a resist layer formed on a substrate under fabrication to a semiconductor deviceFUJITSU LTD·Filed 1988·Granted Aug 29, 1989·54 cites·7 claims
- 1578US5057187AAshing method for removing an organic film on a substance of a semiconductor device under fabricationFUJITSU LTD·Filed 1990·Granted Oct 15, 1991·61 cites·8 claims
- 1677US5832177AMethod for controlling apparatus for supplying steam for ashing processFUJITSU LTD·Filed 1995·Granted Nov 3, 1998·59 cites·4 claims
- 1776US5403436APlasma treating method using hydrogen gasFUJITSU LTD·Filed 1994·Granted Apr 4, 1995·61 cites·12 claims
- 1876US4983254AProcessing for stripping organic materialFUJITSU LTD·Filed 1990·Granted Jan 8, 1991·62 cites·15 claims
- 1975US5773316AMethod and device for measuring physical quantity, method for fabricating semiconductor device, and method and device for measuring wavelengthFUJITSU LTD·Filed 1995·Granted Jun 30, 1998·49 cites·16 claims
- 2074US5885361ACleaning of hydrogen plasma down-stream apparatusFUJITSU LTD·Filed 1995·Granted Mar 23, 1999·44 cites·13 claims
- 2173US5364519AMicrowave plasma processing process and apparatusFUJITSU LTD·Filed 1993·Granted Nov 15, 1994·30 cites·1 claims
- 2273US4423127AMethod of manufacturing a semiconductor deviceFUJITSU LTD·Filed 1981·Granted Dec 27, 1983·35 cites·6 claims
- 2370US5397432AMethod for producing semiconductor integrated circuits and apparatus used in such methodFUJITSU LTD·Filed 1991·Granted Mar 14, 1995·53 cites·19 claims
- 2468US4980022AMethod of removing a layer of organic matterFUJITSU LTD·Filed 1990·Granted Dec 25, 1990·42 cites·11 claims
- 2565US6149829APlasma surface treatment method and resulting deviceMITZEL JAMES W·Filed 1998·Granted Nov 21, 2000·30 cites·11 claims
- 2662US5595916ASilicon oxide film evaluation methodFUJITSU LTD·Filed 1994·Granted Jan 21, 1997·37 cites·17 claims
- 2761US6063300AMethod of manufacturing semiconductor device including light etchingFUJITSU LTD·Filed 1998·Granted May 16, 2000·26 cites·33 claims
- 2860US4861732AMethod for removing an ion-implanted organic resin layer during fabrication of semiconductor devicesFUJITSU LTD·Filed 1988·Granted Aug 29, 1989·26 cites·18 claims
- 2958US6551939B2Plasma surface treatment method and resulting deviceANNEAL CORP·Filed 1999·Granted Apr 22, 2003·30 cites·24 claims
- 3056US6024045AApparatus for fabricating semiconductor device and method for fabricating semiconductor deviceFUJITSU LTD·Filed 1998·Granted Feb 15, 2000·18 cites·10 claims
- 3155US6255197B1Hydrogen annealing method and apparatusMITZEL JIM·Filed 1999·Granted Jul 3, 2001·22 cites·20 claims
- 3252US7014788B1Surface treatment method and equipmentJIM MITZEL·Filed 1999·Granted Mar 21, 2006·20 cites·14 claims
- 3352US5919336AApparatus for fabricating semiconductor device and method for fabricating semiconductor deviceFUJITSU LTD·Filed 1997·Granted Jul 6, 1999·15 cites·13 claims
- 3451US6107215AHydrogen plasma downstream treatment equipment and hydrogen plasma downstream treatment methodFUJITSU LTD·Filed 1998·Granted Aug 22, 2000·16 cites·4 claims
- 3550US6168310B1Device for measuring physical quantity using pulsed laser interferometryFUJITSU LTD·Filed 1998·Granted Jan 2, 2001·16 cites·12 claims
- 3650US4789427AMethod for removing resist from semiconductor deviceFUJITSU LTD·Filed 1987·Granted Dec 6, 1988·19 cites·5 claims
- 3746US5795494ASemiconductor substrate cleaning method and semiconductor device fabrication methodFUJITSU LTD·Filed 1995·Granted Aug 18, 1998·14 cites·11 claims
- 3839US5998104AMethod of stripping a resist maskFUJITSU LTD·Filed 1997·Granted Dec 7, 1999·4 cites·45 claims
- 3931US5034090AProcess for manufacturing semiconductor device involving dry etching an organic resist layerFUJITSU LTD·Filed 1989·Granted Jul 23, 1991·2 cites·9 claims
- 4030US5078824ASemiconductor device manufacturing apparatusFUJITSU LTD·Filed 1990·Granted Jan 7, 1992·0 cites·29 claims
- 4128US6115538ASteam supplying apparatus and method for controlling sameFUJITSU LTD·Filed 1995·Granted Sep 5, 2000·1 cites·3 claims
- 4228USRE36224EMicrowave plasma processing process and apparatusFUJITSU LTD·Filed 1996·Granted Jun 8, 1999·1 cites·2 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →