Inventor · disambiguated record
Tetsuo Shibutami
Also filed as: SHIBUTAMI TETSUO
13 granted patents·2 pending applications·134 citations·filing 2002–2018
86Inventor score
Top patents by PatentIndex Score
15 records- 0193US6605735B2Ruthenium complex, process for producing the same and process for producing thin filmTOSOH CORP·Filed 2002·Granted Aug 12, 2003·126 cites·26 claims
- 0281US8419400B2Sintered body, sputtering target and molding die, and process for producing sintered body employing the sameITOH KENICHI·Filed 2006·Granted Apr 16, 2013·7 cites·18 claims
- 0364US11168393B2Gallium nitride sintered body or gallium nitride molded article, and method for producing sameTOSOH CORP·Filed 2018·Granted Nov 9, 2021·0 cites·11 claims
- 0462US9920420B2Sintered body, sputtering target and molding die, and process for producing sintered body employing the sameITOH KENICHI·Filed 2015·Granted Mar 20, 2018·0 cites·6 claims
- 0560US2011100808A1Cylindrical sputtering target and process for producing the sameTOSOH CORP·Filed 2009·Application pending·0 cites
- 0653US2013213801A1Sintered body, sputtering target and molding die, and process for producing sintered body employing the sameITOH KENICHI·Filed 2013·Application pending·0 cites
- 0752US10174419B2Gallium nitride sintered body or gallium nitride molded article, and method for producing sameMESUDA MASAMI·Filed 2011·Granted Jan 8, 2019·1 cites·11 claims
- 0851US9399815B2Sintered oxide material, method for manufacturing same, sputtering target, oxide transparent electrically conductive film, method for manufacturing same, and solar cellKURAMOCHI HIDETO·Filed 2011·Granted Jul 26, 2016·0 cites·7 claims
- 0950US9418771B2Complex oxide sintered body, sputtering target, transparent conductive oxide film, and method for producing sameTOSOH CORP·Filed 2012·Granted Aug 16, 2016·0 cites·12 claims
- 1050US9127352B2Cylindrical sputtering target, and method for manufacturing sameITOH KENICHI·Filed 2009·Granted Sep 8, 2015·0 cites·3 claims
- 1148US10366870B2Cylindrical sputtering target and process for producing the sameTOSOH CORP·Filed 2015·Granted Jul 30, 2019·0 cites·3 claims
- 1248US8828198B2Cylindrical sputtering targetTODOKO SHIGEHISA·Filed 2008·Granted Sep 9, 2014·0 cites·10 claims
- 1345US9111663B2Sintered composite oxide, manufacturing method therefor, sputtering target, transparent conductive oxide film, and manufacturing method thereforKURAMOCHI HIDETO·Filed 2011·Granted Aug 18, 2015·0 cites·9 claims
- 1441US9396830B2Zinc oxide sintered compact, sputtering target, and zinc oxide thin filmMESUDA MASAMI·Filed 2011·Granted Jul 19, 2016·0 cites·11 claims
- 1537US8206561B2Cylindrical sputtering target, ceramic sintered body, and process for producing sintered bodyITOH KENICHI·Filed 2005·Granted Jun 26, 2012·0 cites·7 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →