Inventor · disambiguated record
Shuogang Huang
Also filed as: HUANG SHUOGANG
6 granted patents·9 pending applications·22 citations·filing 2011–2023
76Inventor score
Top patents by PatentIndex Score
15 records- 0195US9953843B2Chamber for patterning non-volatile metalsLAM RES CORP·Filed 2016·Granted Apr 24, 2018·15 cites·21 claims
- 0272US9570320B2Method to etch copper barrier filmLAM RES CORP·Filed 2014·Granted Feb 14, 2017·3 cites·22 claims
- 0366US8632690B2Method and apparatus for preventing native oxide regrowthADHIPRAKASHA EDWIN·Filed 2011·Granted Jan 21, 2014·2 cites·15 claims
- 0460US8716145B2Critical concentration in etching doped poly silicon with HF/HNO3HUANG SHUOGANG·Filed 2011·Granted May 6, 2014·2 cites·17 claims
- 0559US12205793B2Method and apparatus for anisotropic pattern etching and treatmentLAM RES CORP·Filed 2021·Granted Jan 21, 2025·0 cites·19 claims
- 0653US2023245865A1Movable disk with aperture for etch controlLAM RES CORP·Filed 2022·Application pending·0 cites
- 0753US2024355597A1Ion beam etch system and methodLAM RES CORP·Filed 2022·Application pending·0 cites
- 0851US2018204738A1Chamber for patterning non-volatile metalsLAM RES CORP·Filed 2018·Application pending·0 cites
- 0949US9373518B2Method and apparatus for preventing native oxide regrowthINTERMOLECULAR INC·Filed 2013·Granted Jun 21, 2016·0 cites·13 claims
- 1049US2025259894A1Molybdenum integration and void-free fillLAM RES CORP·Filed 2023·Application pending·0 cites
- 1148US2019148109A1Method and Apparatus for Anisotropic Pattern Etching and TreatmentLAM RES CORP·Filed 2017·Application pending·0 cites
- 1244US2022102624A1Ion beam etching with gas treatment and pulsingLAM RES CORP·Filed 2020·Application pending·0 cites
- 1342US2014315331A1Screening of Surface Passivation Processes for Germanium ChannelsINTERMOLECULAR INC·Filed 2014·Application pending·0 cites
- 1439US2014170857A1Customizing Etch Selectivity with Sequential Multi-Stage Etches with Complementary EtchantsINTERMOLECULAR INC·Filed 2012·Application pending·0 cites
- 1531US2013162995A1Layer Thickness MeasurementHUANG SHUOGANG·Filed 2011·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →