Inventor · disambiguated record
Donald Mammato
Also filed as: MAMMATO DONALD · MAMMATO DONALD C
8 granted patents·145 citations·filing 1984–1992
88Inventor score
Top patents by PatentIndex Score
8 records- 0177US5019488AMethod of producing an image reversal negative photoresist having a photo-labile blocked imideHOECHST CELANESE CORP·Filed 1990·Granted May 28, 1991·34 cites·35 claims
- 0276US4931381AImage reversal negative working O-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatmentHOECHST CELANESE CORP·Filed 1988·Granted Jun 5, 1990·27 cites·16 claims
- 0375US4588670ALight-sensitive trisester of O-quinone diazide containing composition for the preparation of a positive-acting photoresistHOECHST CO AMERICAN·Filed 1985·Granted May 13, 1986·25 cites·17 claims
- 0467US5399456AImage reversal negative working photoresist containing O-quinone diazide and cross-linking compoundHOECHST CELANESE CORP·Filed 1992·Granted Mar 21, 1995·19 cites·11 claims
- 0555US4596763APositive photoresist processing with mid U-V range exposureHOECHST CO AMERICAN·Filed 1984·Granted Jun 24, 1986·15 cites·15 claims
- 0649US4929536AImage reversal negative working O-napthoquinone diazide and cross-linking compound containing photoresist process with thermal curingHOECHST CELANESE CORP·Filed 1988·Granted May 29, 1990·13 cites·16 claims
- 0743US5256522AImage reversal negative working O-naphthoquinone diazide and cross-linking compound containing photoresist process with thermal curingHOECHST CELANESE CORP·Filed 1991·Granted Oct 26, 1993·7 cites·21 claims
- 0837US5217840AImage reversal negative working o-quinone diazide and cross-linking compound containing photoresist process with thermal curing treatment and element produced therefromHOECHST CELANESE CORP·Filed 1990·Granted Jun 8, 1993·5 cites·22 claims
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