Inventor · disambiguated record
Wolfgang Emer
Also filed as: EMER WOLFGANG
20 granted patents·4 pending applications·131 citations·filing 2003–2018
94Inventor score
Top patents by PatentIndex Score
24 records- 0195US7760366B2System for measuring the image quality of an optical imaging systemZEISS CARL SMT AG·Filed 2008·Granted Jul 20, 2010·34 cites·17 claims
- 0293US7796274B2System for measuring the image quality of an optical imaging systemZEISS CARL SMT AG·Filed 2005·Granted Sep 14, 2010·21 cites·34 claims
- 0386US7436521B2Optical measuring apparatus and operating method for imaging error correction in an optical imaging systemZEISS CARL SMT AG·Filed 2005·Granted Oct 14, 2008·9 cites·17 claims
- 0479US7417745B2Device and method for wavefront measurement of an optical imaging system by means of phase-shifting interferometryZEISS CARL SMT AG·Filed 2004·Granted Aug 26, 2008·21 cites·4 claims
- 0579US7372545B2Method for adjusting a projection objectiveZEISS CARL SMT AG·Filed 2005·Granted May 13, 2008·6 cites·14 claims
- 0678US9715177B2Method for adjusting a projection objectiveZEISS CARL SMT GMBH·Filed 2014·Granted Jul 25, 2017·1 cites·13 claims
- 0777US7230220B2Method of determining optical properties and projection exposure system comprising a wavefront detection systemZEISS CARL SMT AG·Filed 2006·Granted Jun 12, 2007·6 cites·26 claims
- 0876US8488127B2System for measuring the image quality of an optical imaging systemMENGEL MARKUS·Filed 2010·Granted Jul 16, 2013·2 cites·38 claims
- 0975US7965377B2Method for adjusting a projection objectiveZEISS CARL SMT GMBH·Filed 2008·Granted Jun 21, 2011·2 cites·42 claims
- 1073US7268890B2Device and method for wavefront measurement of an optical imaging system, and a microlithography projection exposure machineZEISS CARL SMT AG·Filed 2004·Granted Sep 11, 2007·12 cites·14 claims
- 1171US9081294B2Method for measuring an angularly resolved intensity distribution and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2013·Granted Jul 14, 2015·1 cites·12 claims
- 1269US7400388B2Method for determining distortion and/or image surfaceZEISS CARL SMT AG·Filed 2005·Granted Jul 15, 2008·3 cites·10 claims
- 1369US7209241B2Method for determining wavefront aberrationsZEISS CARL SMT AG·Filed 2006·Granted Apr 24, 2007·2 cites·25 claims
- 1466US10018918B2Method for adjusting a projection objectiveZEISS CARL SMT GMBH·Filed 2017·Granted Jul 10, 2018·0 cites·21 claims
- 1564US2019056670A1Method For Adjusting A Projection ObjectiveZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 1663US7019846B2Method for determining wavefront aberrationsZEISS CARL SMT AG·Filed 2003·Granted Mar 28, 2006·8 cites·12 claims
- 1761US9429495B2System for measuring the image quality of an optical imaging systemZEISS CARL SMT GMBH·Filed 2014·Granted Aug 30, 2016·0 cites·22 claims
- 1860US8823948B2System for measuring the image quality of an optical imaging systemZEISS CARL SMT GMBH·Filed 2013·Granted Sep 2, 2014·0 cites·20 claims
- 1959US2018299787A1Method for measuring an angularly resolved intensity distribution and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2018·Application pending·0 cites
- 2057US8134716B2Methods and apparatus for measuring wavefronts and for determining scattered light, and related devices and manufacturing methodsEMER WOLFGANG·Filed 2006·Granted Mar 13, 2012·3 cites·26 claims
- 2155US9915871B2Method for measuring an angularly resolved intensity distribution and projection exposure apparatusZEISS CARL SMT GMBH·Filed 2015·Granted Mar 13, 2018·0 cites·16 claims
- 2255US2011216303A1Method for adjusting a projection objectiveZEISS CARL SMT GMBH·Filed 2011·Application pending·0 cites
- 2348US9753375B2Illumination optical unit for projection lithographyZEISS CARL SMT GMBH·Filed 2014·Granted Sep 5, 2017·0 cites·15 claims
- 2448US2008116402A1Method and a device for measurement of scattered radiation at an optical systemZEISS CARL SMT AG·Filed 2007·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →