Inventor · disambiguated record
Satoshi Biwa
Also filed as: BIWA SATOSHI
10 granted patents·3 pending applications·14 citations·filing 2009–2024
82Inventor score
Top patents by PatentIndex Score
13 records- 0185US12456632B2Substrate processing method and substrate processing apparatusTOKYO ELECTRON LTD·Filed 2022·Granted Oct 28, 2025·1 cites·15 claims
- 0285US10679845B2Substrate processing apparatus having cooling memberTOKYO ELECTRON LTD·Filed 2017·Granted Jun 9, 2020·5 cites·9 claims
- 0377US10593571B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Mar 17, 2020·3 cites·4 claims
- 0476US12057327B2Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2023·Granted Aug 6, 2024·0 cites·8 claims
- 0576US2024371661A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2024·Application pending·0 cites
- 0675US10619922B2Substrate processing apparatus, substrate processing method, and storage mediumTOKYO ELECTRON LTD·Filed 2017·Granted Apr 14, 2020·2 cites·13 claims
- 0764US10276425B2Substrate processing systemTOKYO ELECTRON LTD·Filed 2015·Granted Apr 30, 2019·1 cites·12 claims
- 0858US8671875B2Liquid processing apparatus, liquid processing method and storage mediumNAGAMINE SHUICHI·Filed 2009·Granted Mar 18, 2014·2 cites·7 claims
- 0955US2019206702A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
- 1047US11557492B2Substrate processing apparatus and control method thereofTOKYO ELECTRON LTD·Filed 2020·Granted Jan 17, 2023·0 cites·10 claims
- 1146US10381246B2Substrate processing apparatusTOKYO ELECTRON LTD·Filed 2017·Granted Aug 13, 2019·0 cites·12 claims
- 1244US11295965B2Cleaning apparatus and cleaning method of substrate processing apparatusTOKYO ELECTRON LTD·Filed 2018·Granted Apr 5, 2022·0 cites·8 claims
- 1344US2020168482A1Substrate processing apparatus and substrate processing methodTOKYO ELECTRON LTD·Filed 2019·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →