Inventor · disambiguated record
Miguel Garcia Granda
Also filed as: GARCIA GRANDA MIGUEL
6 granted patents·2 pending applications·4 citations·filing 2013–2022
70Inventor score
Technology areasG03F
Files withASML NETHERLANDS BV8
Top patents by PatentIndex Score
8 records- 0177US10571812B2Method of calibrating focus measurements, measurement method and metrology apparatus, lithographic system and device manufacturing methodASML NETHERLANDS BV·Filed 2018·Granted Feb 25, 2020·2 cites·15 claims
- 0273US9518936B2Method and apparatus for determining lithographic quality of a structureASML NETHERLANDS BV·Filed 2013·Granted Dec 13, 2016·2 cites·6 claims
- 0363US10871716B2Metrology robustness based on through-wavelength similarityASML NETHERLANDS BV·Filed 2019·Granted Dec 22, 2020·0 cites·21 claims
- 0458US11385554B2Metrology apparatus and method for determining a characteristic relating to one or more structures on a substrateASML NETHERLANDS BV·Filed 2019·Granted Jul 12, 2022·0 cites·20 claims
- 0557US10394132B2Metrology robustness based on through-wavelength similarityASML NETHERLANDS BV·Filed 2017·Granted Aug 27, 2019·0 cites·20 claims
- 0656US2025060661A1Substrate comprising a target arrangement, associated patterning device and metrology methodASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
- 0750US10895811B2Methods and patterning devices and apparatuses for measuring focus performance of a lithographic apparatus, device manufacturing methodASML NETHERLANDS BV·Filed 2019·Granted Jan 19, 2021·0 cites·15 claims
- 0849US2025231496A1Methods for measuring at least one target on a substrate and associated apparatuses and substrateASML NETHERLANDS BV·Filed 2022·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →