Inventor · disambiguated record
Takashi Masubuchi
Also filed as: MASUBUCHI TAKASHI
3 granted patents·8 pending applications·7 citations·filing 2009–2023
54Inventor score
Top patents by PatentIndex Score
11 records- 0179US8663897B2Fluorine-containing sulfonates having polymerizable anions and manufacturing method therefor, fluorine-containing resins, resist compositions, and pattern-forming method using sameMASUBUCHI TAKASHI·Filed 2009·Granted Mar 4, 2014·7 cites·24 claims
- 0259US2023333468A1Resin composition, cured film, method for manufacturing cured film, substrate having multilayer film, method for producing patterned substrate, photosensitive resin composition, method for producing pattern cured film, method for producing polymer, and method for producing resin compositionCENTRAL GLASS CO LTD·Filed 2023·Application pending·0 cites
- 0359US2023408922A1Application liquid for optical member, polymer, photosensitive application liquid, method for producing cured film, method for producing patterned cured film, and method for producing polymerCENTRAL GLASS CO LTD·Filed 2023·Application pending·0 cites
- 0458US2025362608A1Resin Composition for Forming Resist Upper Layer Film, Pattern Forming Method, and Electronic Device Producing MethodCENTRAL GLASS CO LTD·Filed 2023·Application pending·0 cites
- 0558US2023244145A1Silicon-containing monomer mixture, polysiloxane, resin composition, photosensitive resin composition, cured film, production method for cured film, patterned cured film, and production method for patterned cured filmCENTRAL GLASS CO LTD·Filed 2023·Application pending·0 cites
- 0656US2023037301A1Negative photosensitive resin composition, pattern structure and method for producing patterned cured filmCENTRAL GLASS CO LTD·Filed 2022·Application pending·0 cites
- 0752US2021395461A1Resin composition, photosensitive resin composition, cured film, method for manufacturing cured film, patterned cured film, method for producing patterned cured filmCENTRAL GLASS CO LTD·Filed 2019·Application pending·0 cites
- 0851US2023322818A1Silicon compound, reactive material, resin composition, photosensitive resin composition, cured film, method of manufacturing cured film, patterned cured film, and method of manufacturing patterned cured filmCENTRAL GLASS CO LTD·Filed 2020·Application pending·0 cites
- 0951US2023039535A1Composition, composition precursor solution, production method for composition, substrate with multilayer film, and production method for patterned substrateCENTRAL GLASS CO LTD·Filed 2022·Application pending·0 cites
- 1034US8877960B2Fluoroalkanesulfonic acid ammonium salts and method for producing sameNAGAMORI MASASHI·Filed 2010·Granted Nov 4, 2014·0 cites·10 claims
- 1122US9024058B2Ammonium fluoroalkanesulfonates and a synthesis method thereforNAGAMORI MAGASHI·Filed 2010·Granted May 5, 2015·0 cites·10 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →