Inventor · disambiguated record
Seung-Wook Shin
Also filed as: SHIN SEUNG-WOOK
6 granted patents·20 pending applications·5 citations·filing 2008–2025
69Inventor score
Top patents by PatentIndex Score
26 records- 0176US9665003B2Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsCHOI YOO-JEONG·Filed 2014·Granted May 30, 2017·3 cites·18 claims
- 0276US2025115691A1Method of forming patternsSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0375US7993810B2(Meth)acrylate compound having aromatic acid labile group, photosensitive polymer, resist composition, and associated methodsCHEIL IND INC·Filed 2008·Granted Aug 9, 2011·2 cites·15 claims
- 0471US2023406970A1Method of forming patternsSAMSUNG SDI CO LTD·Filed 2023·Application pending·0 cites
- 0567US2025216779A1Semiconductor photoresist composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0658US2025264798A1Semiconductor photoresist compositions and methods of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0758US2025224669A1Method of forming patterns and photoresist filmSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0857US2025271754A1Semiconductor photoresist compositions and methods of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 0957US2025264797A1Semiconductor photoresist compositions and methods of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1056US2025263427A1Semiconductor photoresist compositions and methods of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1156US2025216778A1Semiconductor photoresist composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1255US2020062875A1Polymer, organic layer composition and method of forming patternsSAMSUNG SDI CO LTD·Filed 2019·Application pending·0 cites
- 1355US2025155799A1Semiconductor photoresist compositions and methods of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1454US2025216777A1Semiconductor photoresist composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1554US2025102907A1Semiconductor photoresist composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2024·Application pending·0 cites
- 1650US8017301B2Photosensitive polymer, resist composition, and associated methodsCHEIL IND INC·Filed 2008·Granted Sep 13, 2011·0 cites·15 claims
- 1746US2009155719A1Aromatic (meth)acrylate compound having an alpha-hydroxy, photosensitive polymer, resist compositions, and associated methodsCHOI SANG-JUN·Filed 2008·Application pending·0 cites
- 1846US2025355348A1Semiconductor photoresist compositions and methods of forming patterns using the compositionsSAMSUNG SDI CO LTD·Filed 2025·Application pending·0 cites
- 1946US2023221641A1Hardmask composition, hardmask layer, and method of forming patternsSAMSUNG SDI CO LTD·Filed 2022·Application pending·0 cites
- 2042US9671688B2Monomer for hardmask composition, hardmask composition including said monomer, and method for forming pattern using said hardmask compositionCHEIL IND INC·Filed 2013·Granted Jun 6, 2017·0 cites·12 claims
- 2142US2015187566A1Hardmask composition, method of forming patterns using the hardmask composition and semiconductor integrated circuit device including the patternsSAMSUNG SDI CO LTD·Filed 2014·Application pending·0 cites
- 2242US2025284194A1Semiconductor photoresist composition and method of forming patterns using the compositionSAMSUNG SDI CO LTD·Filed 2025·Application pending·0 cites
- 2339US12115212B2Methods of decreasing amyloid beta (Aβ) plaque deposition and hyperphosphorylated tau plaque deposition in Alzheimer's disease using a cystatin C fusion proteinL & J BIO CO LTD·Filed 2019·Granted Oct 15, 2024·0 cites·4 claims
- 2438US10345706B2Monomer for hardmask composition and hardmask composition including the monomer and method of forming patterns using the hardmask compositionSONG HYUN JI·Filed 2014·Granted Jul 9, 2019·0 cites·10 claims
- 2535US2010239982A1Photoresist composition with high etching resistanceCHEIL IND INC·Filed 2010·Application pending·0 cites
- 2634US2010233620A1Copolymer and photoresist composition including the sameCHOI SANG-JUN·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →