Inventor · disambiguated record
Arthur Kenneth Hochberg
Also filed as: HOCHBERG ARTHUR K · HOCHBERG ARTHUR KENNETH
33 granted patents·3 pending applications·2,184 citations·filing 1974–2014
98Inventor score
Files withAIR PROD & CHEM28HOCHBERG ARTHUR K2AIR PRODUCTS ABD CHEMICALS INC1BURROUGHS CORP1LEI XINJIAN1
Top patents by PatentIndex Score
36 records- 0198US7122222B2Precursors for depositing silicon containing films and processes thereofAIR PROD & CHEM·Filed 2003·Granted Oct 17, 2006·634 cites·19 claims
- 0297US6537613B1Process for metal metalloid oxides and nitrides with compositional gradientsAIR PROD & CHEM·Filed 2000·Granted Mar 25, 2003·155 cites·28 claims
- 0396US7875556B2Precursors for CVD silicon carbo-nitride and silicon nitride filmsAIR PROD & CHEM·Filed 2005·Granted Jan 25, 2011·29 cites·24 claims
- 0495US5204141ADeposition of silicon dioxide films at temperatures as low as 100 degree c. by lpcvd using organodisilane sourcesAIR PROD & CHEM·Filed 1991·Granted Apr 20, 1993·151 cites·22 claims
- 0594US4981724ADeposition of silicon oxide films using alkylsilane liquid sourcesHOCHBERG ARTHUR K·Filed 1977·Granted Jan 1, 1991·84 cites·10 claims
- 0693US7932413B2Precursors for CVD silicon carbo-nitride filmsAIR PROD & CHEM·Filed 2008·Granted Apr 26, 2011·14 cites·9 claims
- 0793US3966577ADielectrically isolated semiconductor devicesTRW INC·Filed 1974·Granted Jun 29, 1976·55 cites·4 claims
- 0892US4992306ADeposition of silicon dioxide and silicon oxynitride films using azidosilane sourcesAIR PRODUCTS ABD CHEMICALS INC·Filed 1990·Granted Feb 12, 1991·127 cites·25 claims
- 0991US5874368ASilicon nitride from bis(tertiarybutylamino)silaneAIR PROD & CHEM·Filed 1997·Granted Feb 23, 1999·186 cites·8 claims
- 1091US5322712AProcess for improved quality of CVD copper filmsAIR PROD & CHEM·Filed 1993·Granted Jun 21, 1994·72 cites·7 claims
- 1190US5976991ADeposition of silicon dioxide and silicon oxynitride using bis(tertiarybutylamino) silaneAIR PROD & CHEM·Filed 1998·Granted Nov 2, 1999·101 cites·9 claims
- 1289US7288145B2Precursors for depositing silicon containing filmsAIR PROD & CHEM·Filed 2006·Granted Oct 30, 2007·13 cites·19 claims
- 1389US6503561B1Liquid precursor mixtures for deposition of multicomponent metal containing materialsAIR PROD & CHEM·Filed 2000·Granted Jan 7, 2003·40 cites·23 claims
- 1485US5298075AFurnace tube cleaning processAIR PROD & CHEM·Filed 1993·Granted Mar 29, 1994·77 cites·5 claims
- 1584US9640386B2Precursors for CVD silicon carbo-nitride filmsAIR PROD & CHEM·Filed 2014·Granted May 2, 2017·3 cites·18 claims
- 1684US5626775APlasma etch with trifluoroacetic acid and derivativesAIR PROD & CHEM·Filed 1996·Granted May 6, 1997·73 cites·20 claims
- 1782US7261118B2Method and vessel for the delivery of precursor materialsAIR PROD & CHEM·Filed 2004·Granted Aug 28, 2007·29 cites·35 claims
- 1880US5744196ALow temperature deposition of silicon dioxide using organosilanesAIR PROD & CHEM·Filed 1996·Granted Apr 28, 1998·59 cites·7 claims
- 1977US5492736AFluorine doped silicon oxide processAIR PROD & CHEM·Filed 1994·Granted Feb 20, 1996·60 cites·15 claims
- 2075US6500499B1Deposition and annealing of multicomponent ZrSnTi and HfSnTi oxide thin films using solventless liquid mixture of precursorsAIR PROD & CHEM·Filed 2000·Granted Dec 31, 2002·14 cites·18 claims
- 2169US6616972B1Synthesis of metal oxide and oxynitrideAIR PROD & CHEM·Filed 1999·Granted Sep 9, 2003·27 cites·17 claims
- 2269US5433975ADeposition of tungsten films from mixtures of tungsten hexafluoride organohydrosilanes and hydrogenAIR PROD & CHEM·Filed 1993·Granted Jul 18, 1995·44 cites·17 claims
- 2369US4992299ADeposition of silicon nitride films from azidosilane sourcesAIR PROD & CHEM·Filed 1990·Granted Feb 12, 1991·44 cites·24 claims
- 2466US7033560B2Single source mixtures of metal siloxidesAIR PROD & CHEM·Filed 2002·Granted Apr 25, 2006·4 cites·15 claims
- 2566US6844271B2Process of CVD of Hf and Zr containing oxynitride filmsAIR PROD & CHEM·Filed 2003·Granted Jan 18, 2005·13 cites·20 claims
- 2663US4220116AReactant gas flow structure for a low pressure chemical vapor deposition systemBURROUGHS CORP·Filed 1978·Granted Sep 2, 1980·15 cites·12 claims
- 2761US6319567B1Synthesis of tantalum nitrideAIR PROD & CHEM·Filed 1999·Granted Nov 20, 2001·18 cites·8 claims
- 2857US8932675B2Methods for depositing silicon carbo-nitride filmXIAO MANCHAO·Filed 2012·Granted Jan 13, 2015·0 cites·8 claims
- 2957US7582574B2Diethylsilane as a silicon source in the deposition of metal silicate filmsAIR PROD & CHEM·Filed 2007·Granted Sep 1, 2009·0 cites·16 claims
- 3054US8383849B2Precursors for CVD silicon carbo-nitride filmsAIR PROD & CHEM·Filed 2011·Granted Feb 26, 2013·0 cites·10 claims
- 3153US5288662ALow ozone depleting organic chlorides for use during silicon oxidation and furnace tube cleaningAIR PROD & CHEM·Filed 1992·Granted Feb 22, 1994·19 cites·5 claims
- 3252USRE35614EProcess for improved quality of CVD copper filmsAIR PROD & CHEM·Filed 1996·Granted Sep 23, 1997·13 cites·7 claims
- 3340US5013690AMethod for deposition of silicon films from azidosilane sourcesAIR PROD & CHEM·Filed 1990·Granted May 7, 1991·11 cites·9 claims
- 3439US2006182885A1Preparation of metal silicon nitride films via cyclic depositionLEI XINJIAN·Filed 2005·Application pending·0 cites
- 3537US2006045986A1Silicon nitride from aminosilane using PECVDHOCHBERG ARTHUR K·Filed 2004·Application pending·0 cites
- 3634US2005181633A1Precursors for depositing silicon-containing films and processes thereofFiled 2004·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →