Inventor · disambiguated record
Akira Kamabuchi
Also filed as: KAMABUCHI AKIRA
19 granted patents·4 pending applications·109 citations·filing 1998–2013
91Inventor score
Top patents by PatentIndex Score
23 records- 0186US6627381B1Chemical amplification type positive resist compositionSUMITOMO CHEMICAL CO·Filed 2000·Granted Sep 30, 2003·28 cites·8 claims
- 0281US6548220B2Chemical amplifying type positive resist composition and sulfonium saltSUMITOMO CHEMICAL CO·Filed 2001·Granted Apr 15, 2003·54 cites·9 claims
- 0376US8592129B2Resin, resist composition and method for producing resist patternICHIKAWA KOJI·Filed 2010·Granted Nov 26, 2013·2 cites·14 claims
- 0473US6818379B2Sulfonium salt and use thereofSUMITOMO CHEMICAL CO·Filed 2002·Granted Nov 16, 2004·14 cites·10 claims
- 0572US7576223B2Chemical amplification type resist compositionSUMITOMO CHEMICAL CO·Filed 2008·Granted Aug 18, 2009·2 cites·7 claims
- 0670US7160669B2Chemical amplification type resist compositionSUMITOMO CHEMICAL CO·Filed 2003·Granted Jan 9, 2007·4 cites·10 claims
- 0758US9268226B2Resin, resist composition and method for producing resist patternSUMITOMO CHEMICAL CO·Filed 2013·Granted Feb 23, 2016·0 cites·15 claims
- 0855US6777511B2Process for producing poly (meth) acrylates having reduced metal contentSUMITOMO CHEMICAL CO·Filed 2001·Granted Aug 17, 2004·3 cites·5 claims
- 0954US7396899B2Chemical amplification type resist compositionSUMITOMO CHEMICAL CO·Filed 2006·Granted Jul 8, 2008·0 cites·3 claims
- 1048US2009286937A1Chemically amplified positive resist compositionSUMITOMO CHEMICAL CO·Filed 2009·Application pending·0 cites
- 1148US2011189618A1Resist processing methodSUMITOMO CHEMICAL CO·Filed 2009·Application pending·0 cites
- 1247US9360754B2Resin and photoresist composition comprising the sameICHIKAWA KOJI·Filed 2011·Granted Jun 7, 2016·0 cites·13 claims
- 1344US8685618B2Resist composition and method for producing resist patternICHIKAWA KOJI·Filed 2012·Granted Apr 1, 2014·0 cites·6 claims
- 1444US8563217B2Resist composition and method for producing resist patternICHIKAWA KOJI·Filed 2012·Granted Oct 22, 2013·0 cites·6 claims
- 1544US5965748ASuccinimide derivative, process for production and use thereofSUMITOMO CHEMICAL CO·Filed 1998·Granted Oct 12, 1999·2 cites·6 claims
- 1643US8859182B2Resist composition and method for producing resist patternICHIKAWA KOJI·Filed 2012·Granted Oct 14, 2014·0 cites·6 claims
- 1743US8481243B2Resin and photoresist composition comprising the sameKIM HYUNGJOO·Filed 2012·Granted Jul 9, 2013·0 cites·13 claims
- 1841US8298746B2Chemically amplified positive resist compositionSHIGEMATSU JUNJI·Filed 2009·Granted Oct 30, 2012·0 cites·3 claims
- 1940US8697882B2Compound, resin and photoresist compositionKIM HYUNGJOO·Filed 2011·Granted Apr 15, 2014·0 cites·3 claims
- 2040US2007020479A1Luminescent-polymer compositionUETANI YASUNORI·Filed 2004·Application pending·0 cites
- 2136US2010273113A1Process for producing photoresist patternSUMITOMO CHEMICAL CO·Filed 2010·Application pending·0 cites
- 2230US7135268B2Amplification type positive resist compositionSUMITOMO CHEMICAL CO·Filed 2003·Granted Nov 14, 2006·0 cites·13 claims
- 2329US10377692B2Photoresist compositionKAMABUCHI AKIRA·Filed 2010·Granted Aug 13, 2019·0 cites·4 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →