Inventor · disambiguated record
Te-Hung Wu
Also filed as: WU TE-HUNG
11 granted patents·7 pending applications·50 citations·filing 2001–2016
87Inventor score
Top patents by PatentIndex Score
18 records- 0187US8151221B2Method to compensate optical proximity correctionHUANG CHUN-HSIEN·Filed 2010·Granted Apr 3, 2012·6 cites·5 claims
- 0280US6536130B1Overlay mark for concurrently monitoring alignment accuracy, focus, leveling and astigmatism and method of application thereofUNITED MICROELECTRONICS CORP·Filed 2001·Granted Mar 25, 2003·24 cites·14 claims
- 0379US8321820B2Method to compensate optical proximity correctionHUANG CHUN-HSIEN·Filed 2012·Granted Nov 27, 2012·3 cites·5 claims
- 0478US7669153B2Method for correcting photomask patternUNITED MICROELECTRONICS CORP·Filed 2007·Granted Feb 23, 2010·5 cites·13 claims
- 0570US7664614B2Method of inspecting photomask defectUNITED MICROELECTRONICS CORP·Filed 2007·Granted Feb 16, 2010·3 cites·13 claims
- 0665US8321822B2Method and computer-readable medium of optical proximity correctionYANG YU-SHIANG·Filed 2010·Granted Nov 27, 2012·2 cites·10 claims
- 0764US7913196B2Method of verifying a layout patternUNITED MICROELECTRONICS CORP·Filed 2007·Granted Mar 22, 2011·3 cites·28 claims
- 0861US8042069B2Method for selectively amending layout patternsUNITED MICROELECTRONICS CORP·Filed 2008·Granted Oct 18, 2011·3 cites·36 claims
- 0956US7886254B2Method for amending layout patternsUNITED MICROELECTRONICS CORP·Filed 2008·Granted Feb 8, 2011·1 cites·28 claims
- 1044US8166424B2Method for constructing OPC modelWU TE-HUNG·Filed 2008·Granted Apr 24, 2012·0 cites·12 claims
- 1141US8225237B2Method to determine process windowWU TE-HUNG·Filed 2008·Granted Jul 17, 2012·0 cites·17 claims
- 1240US2007024835A1Method for improving illumination uniformity in exposure process, and exposure apparatusHUANG KUO-CHUN·Filed 2005·Application pending·0 cites
- 1338US2007072090A1Reticle having a protection layerCHANG SHENG-YUEH·Filed 2005·Application pending·0 cites
- 1437US2006257749A1Method for reducing critical dimensionCHANG SHENG-YUEH·Filed 2005·Application pending·0 cites
- 1536US2007053077A1Customer illumination aperture structureLIN LING-CHIEH·Filed 2005·Application pending·0 cites
- 1633US2007048669A1Method of forming the photo resist featureWU TE-HUNG·Filed 2005·Application pending·0 cites
- 1732US2016199802A1Liquid molecule refinement and containment deviceWU TE-HUNG·Filed 2016·Application pending·0 cites
- 1832US2011309424A1Structure of memory device and process for fabricting the sameWEI MING-TE·Filed 2010·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →