Inventor · disambiguated record
Edwin Arevalo
Also filed as: AREVALO EDWIN · AREVALO EDWIN A
6 granted patents·9 pending applications·30 citations·filing 2001–2025
78Inventor score
Files withVARIAN SEMICONDUCTOR EQUIPMENT5APPLIED MATERIALS INC4ENGLAND JONATHAN GERALD1PERSING HAROLD M1VARIAN SEMICONDUCTOR EQUIPMENT ASS INC1
Top patents by PatentIndex Score
15 records- 0184US7642150B2Techniques for forming shallow junctionsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Granted Jan 5, 2010·9 cites·29 claims
- 0278US8450193B2Techniques for temperature-controlled ion implantationENGLAND JONATHAN GERALD·Filed 2007·Granted May 28, 2013·9 cites·1 claims
- 0365US7927986B2Ion implantation with heavy halogenide compoundsVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2008·Granted Apr 19, 2011·2 cites·25 claims
- 0463US10515802B2Techniques for forming low stress mask using implantationVARIAN SEMICONDUCTOR EQUIPMENT ASS INC·Filed 2018·Granted Dec 24, 2019·1 cites·17 claims
- 0557US7026229B2Athermal annealing with rapid thermal annealing system and methodVARTAN SEMICONDUCTOR EQUIPMENT·Filed 2001·Granted Apr 11, 2006·9 cites·11 claims
- 0652US2024379376A1Implant into euv metal oxide photoresist module to reduce euv doseAPPLIED MATERIALS INC·Filed 2023·Application pending·0 cites
- 0751US11551904B2System and technique for profile modulation using high tilt anglesAPPLIED MATERIALS INC·Filed 2020·Granted Jan 10, 2023·0 cites·20 claims
- 0846US2008318345A1Plasma ion implantation process control using reflectometryPERSING HAROLD M·Filed 2007·Application pending·0 cites
- 0946US2025226211A1Increased etch resistance of nitride layers using chemical vapor deposition and hot ion implantationAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1046US2025226226A1Stress modulation of nitride layers using chemical vapor deposition and hot ion implantationAPPLIED MATERIALS INC·Filed 2025·Application pending·0 cites
- 1144US2007224840A1Method of Plasma Processing with In-Situ Monitoring and Process Parameter TuningVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2007·Application pending·0 cites
- 1242US2008090392A1Technique for Improved Damage Control in a Plasma Doping (PLAD) Ion ImplantationVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2006·Application pending·0 cites
- 1336US2004235281A1Apparatus and methods for junction formation using optical illuminationFiled 2004·Application pending·0 cites
- 1435US2005260838A1Methods and systems for dopant profilingVARIAN SEMICONDUCTOR EQUIPMENT·Filed 2003·Application pending·0 cites
- 1533US2003186519A1Dopant diffusion and activation control with athermal annealingFiled 2002·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →