Inventor · disambiguated record
Takeshi Haraguchi
Also filed as: HARAGUCHI TAKESHI
17 granted patents·15 pending applications·193 citations·filing 1999–2018
93Inventor score
Top patents by PatentIndex Score
32 records- 0194US6787780B2Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a semiconductor deviceADVANTEST CORP·Filed 2001·Granted Sep 7, 2004·51 cites·21 claims
- 0291US8390201B2Multi-column electron beam exposure apparatus and magnetic field generation deviceYASUDA HIROSHI·Filed 2010·Granted Mar 5, 2013·14 cites·4 claims
- 0388US6804288B2Electron beam exposure apparatus and electron beam deflection apparatusADVANTEST CORP·Filed 2003·Granted Oct 12, 2004·31 cites·15 claims
- 0485US8563709B2Method for inhibiting function of micro-RNAIBA HIDEO·Filed 2011·Granted Oct 22, 2013·11 cites·17 claims
- 0582US7919750B2Electron gun, electron beam exposure apparatus, and exposure methodADVANTEST CORP·Filed 2008·Granted Apr 5, 2011·6 cites·16 claims
- 0680US6703624B2Multi-beam exposure apparatus using a multi-axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor deviceADVANTEST CORP·Filed 2001·Granted Mar 9, 2004·15 cites·24 claims
- 0779US6465796B1Charge-particle beam lithography system of blanking aperture array typeADVANTEST CORP·Filed 1999·Granted Oct 15, 2002·33 cites·8 claims
- 0875US11479769B2Technique for treating cancer using structurally-reinforced S-TuDUNIV CHIBA NAT UNIV CORP·Filed 2018·Granted Oct 25, 2022·1 cites·1 claims
- 0968US6777694B2Electron beam exposure system and electron lensADVANTEST CORP·Filed 2003·Granted Aug 17, 2004·7 cites·16 claims
- 1061US6727658B2Electron beam generating apparatus and electron beam exposure apparatusADVANTEST CORP·Filed 2003·Granted Apr 27, 2004·4 cites·19 claims
- 1156US6870310B2Multibeam generating apparatus and electron beam drawing apparatusCANON KK·Filed 2003·Granted Mar 22, 2005·5 cites·15 claims
- 1253US6509568B1Electrostatic deflector for electron beam exposure apparatusADVANTEST CORP·Filed 1999·Granted Jan 21, 2003·15 cites·8 claims
- 1352US8330344B2Electron gun minimizing sublimation of electron source and electron beam exposure apparatus using the sameYASUDA HIROSHI·Filed 2009·Granted Dec 11, 2012·0 cites·6 claims
- 1452US2018240087A1Checkout systemTOSHIBA TEC KK·Filed 2018·Application pending·0 cites
- 1550US7394068B2Mask inspection apparatus, mask inspection method, and electron beam exposure systemADVANTEST CORP·Filed 2005·Granted Jul 1, 2008·0 cites·6 claims
- 1649US10844376B2Structurally-enhanced miRNA inhibitor S-TuDUNIV TOKYO·Filed 2016·Granted Nov 24, 2020·0 cites·18 claims
- 1747US2016321639A1Customer management system, customer management apparatus and customer management methodTOSHIBA TEC KK·Filed 2016·Application pending·0 cites
- 1847US2008211376A1Electron gun, electron beam exposure apparatus, and exposure methodYASUDA HIROSHI·Filed 2008·Application pending·0 cites
- 1946US2016260074A1Sales data processing apparatusTOSHIBA TEC KK·Filed 2016·Application pending·0 cites
- 2044US11285168B2Method for suppressing tumors by miR-200 family inhibitionUNIV CHIBA NAT UNIV CORP·Filed 2016·Granted Mar 29, 2022·0 cites·8 claims
- 2143US2017221292A1Coin depositing deviceTOSHIBA TEC KK·Filed 2017·Application pending·0 cites
- 2243US2017224134A1Money depositing/dispensing apparatusTOSHIBA TEC KK·Filed 2017·Application pending·0 cites
- 2342US2018232717A1Checkout systemTOSHIBA TEC KK·Filed 2018·Application pending·0 cites
- 2440US2017231054A1Money handling apparatusTOSHIBA TEC KK·Filed 2017·Application pending·0 cites
- 2538US6764925B2Semiconductor device manufacturing system and electron beam exposure apparatusADVANTEST CORP·Filed 2001·Granted Jul 20, 2004·0 cites·18 claims
- 2637US2002020354A1Electrostatic deflector for electron beam exposure apparatusFiled 2001·Application pending·0 cites
- 2737US2001045528A1Electrostatic deflector for electron beam exposure apparatusFiled 2001·Application pending·0 cites
- 2837US2003071231A1Electron beam exposing method and exposure apparatusFiled 2002·Application pending·0 cites
- 2936US2001028038A1Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method a semiconductor deviceFiled 2001·Application pending·0 cites
- 3036US2003189180A1Multi-beam exposure apparatus using a multi- axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor deviceFiled 2001·Application pending·0 cites
- 3136US2001028044A1Multi-beam exposure apparatus using a muti-axis electron lens, electron lens convergencing a plurality of electron beam and fabrication method of a semiconductor deviceFiled 2001·Application pending·0 cites
- 3236US2001028043A1Multi-beam exposure apparatus using a multi-axis electron lens, fabrication method of a multi-axis electron lens and fabrication method of a semiconductor deviceFiled 2001·Application pending·0 cites
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →