Inventor · disambiguated record
Helin Huang
Also filed as: HUANG HELIN
7 granted patents·7 pending applications·26 citations·filing 2012–2025
77Inventor score
Top patents by PatentIndex Score
14 records- 0195US9631122B1Tungsten-processing slurry with cationic surfactantCABOT MICROELECTRONICS CORP·Filed 2015·Granted Apr 25, 2017·19 cites·23 claims
- 0283US10066126B2Tungsten processing slurry with catalystCABOT MICROELECTRONICS CORP·Filed 2016·Granted Sep 4, 2018·5 cites·18 claims
- 0373US9771496B2Tungsten-processing slurry with cationic surfactant and cyclodextrinCABOT MICROELECTRONICS CORP·Filed 2015·Granted Sep 26, 2017·1 cites·22 claims
- 0468US11043151B2Surface treated abrasive particles for tungsten buff applicationsCABOT MICROELECTRONICS CORP·Filed 2017·Granted Jun 22, 2021·1 cites·19 claims
- 0565US2025270421A1Surface coated abrasive particles for tungsten buff applicationsCMC MAT LLC·Filed 2025·Application pending·0 cites
- 0658US2024150614A1Positively charged abrasive with negatively charged ionic oxidizer for polishing applicationENTEGRIS INC·Filed 2023·Application pending·0 cites
- 0755US11802220B2Silica-based slurry for selective polishing of carbon-based filmsCMC MAT INC·Filed 2021·Granted Oct 31, 2023·0 cites·9 claims
- 0855US2025075104A1Titanium oxide-based chemical-mechanical polishing composition for heavily-doped boron silicon filmsENTEGRIS INC·Filed 2024·Application pending·0 cites
- 0954US2020332150A1Surface coated abrasive particles for tungsten buff applicationsCABOT MICROELECTRONICS CORP·Filed 2020·Application pending·0 cites
- 1052US11597854B2Method to increase barrier film removal rate in bulk tungsten slurryCABOT MICROELECTRONICS CORP·Filed 2019·Granted Mar 7, 2023·0 cites·28 claims
- 1147US2023242790A1Ceria-based slurry compositions for selective and nonselective cmp of silicon oxide, silicon nitride, and polysiliconCMC MAT INC·Filed 2022·Application pending·0 cites
- 1247US2023242791A1Ceria-based slurry compositions for selective and nonselective cmp of silicon oxide, silicon nitride, and polysiliconCMC MAT INC·Filed 2022·Application pending·0 cites
- 1346US10522341B2Composition and method for removing residue from chemical-mechanical planarization substrateCABOT MICROELECTRONICS CORP·Filed 2017·Granted Dec 31, 2019·0 cites·15 claims
- 1442US2015118760A1Fluorescent sensing of vapors using tubular nanofibril materialsZANG LING·Filed 2012·Application pending·0 cites
Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →