Inventor · disambiguated record
Alek Chi-Heng Chen
Also filed as: CHEN ALEK C · CHEN ALEK CHI-HENG
6 granted patents·2 pending applications·63 citations·filing 1995–2013
79Inventor score
Top patents by PatentIndex Score
8 records- 0184US7582413B2Substrate, method of exposing a substrate, machine readable mediumASML NETHERLANDS BV·Filed 2005·Granted Sep 1, 2009·9 cites·11 claims
- 0278US8945800B2Method of preparing a pattern, method of forming a mask set, device manufacturing method and computer programASML NETHERLANDS BV·Filed 2013·Granted Feb 3, 2015·3 cites·19 claims
- 0378US5504793AMagnification correction for 1-X proximity X-Ray lithographyLORAL FEDERAL SYSTEMS COMPANY·Filed 1995·Granted Apr 2, 1996·49 cites·25 claims
- 0470US9541500B2Method for calibrating a manufacturing process modelTSAI KUEN-YU·Filed 2012·Granted Jan 10, 2017·2 cites·14 claims
- 0548US7713682B2Substrate, method of exposing a substrate, machine readable mediumASML NETHERLANDS BV·Filed 2006·Granted May 11, 2010·0 cites·8 claims
- 0640US2007121090A1Lithographic apparatus and device manufacturing methodASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 0737US2007018286A1Substrate, lithographic multiple exposure method, machine readable mediumASML NETHERLANDS BV·Filed 2005·Application pending·0 cites
- 0833US6717685B1In situ proximity gap monitor for lithographyBAE SYSTEMS INFORMATION·Filed 2000·Granted Apr 6, 2004·0 cites·20 claims
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Identity basis: PatentsView inventor disambiguation (2025Q4-odp release). How scoring works →