Inventor · disambiguated record
Hidemi Kawai
Also filed as: KAWAI HIDEMI
21 granted patents·7 pending applications·716 citations·filing 1985–2024
96Inventor score
Top patents by PatentIndex Score
28 records- 0199US7522259B2Cleanup method for optics in immersion lithographyNIKON CORP·Filed 2005·Granted Apr 21, 2009·71 cites·38 claims
- 0297US5117255AProjection exposure apparatusNIKON CORP·Filed 1991·Granted May 26, 1992·152 cites·13 claims
- 0397US4780747AProjection exposure apparatusNIPPON KOGAKU KK·Filed 1987·Granted Oct 25, 1988·139 cites·12 claims
- 0492US8269946B2Cleanup method for optics in immersion lithography supplying cleaning liquid at different times than immersion liquidKAWAI HIDEMI·Filed 2009·Granted Sep 18, 2012·8 cites·27 claims
- 0588US8493545B2Cleanup method for optics in immersion lithography supplying cleaning liquid onto a surface of object below optical element, liquid supply port and liquid recovery portKAWAI HIDEMI·Filed 2009·Granted Jul 23, 2013·5 cites·41 claims
- 0687US5617182AScanning exposure methodNIKON CORP·Filed 1994·Granted Apr 1, 1997·49 cites·17 claims
- 0787US4860374AApparatus for detecting position of reference patternNIKON CORP·Filed 1988·Granted Aug 22, 1989·109 cites·7 claims
- 0886US4780616AProjection optical apparatus for mask to substrate alignmentNIPPON KOGAKU KK·Filed 1987·Granted Oct 25, 1988·42 cites·15 claims
- 0985US8670104B2Cleanup method for optics in immersion lithography with cleaning liquid opposed by a surface of objectKAWAI HIDEMI·Filed 2009·Granted Mar 11, 2014·4 cites·11 claims
- 1085US8670103B2Cleanup method for optics in immersion lithography using bubblesKAWAI HIDEMI·Filed 2007·Granted Mar 11, 2014·4 cites·22 claims
- 1185US8085381B2Cleanup method for optics in immersion lithography using sonic deviceKAWAI HIDEMI·Filed 2007·Granted Dec 27, 2011·4 cites·17 claims
- 1283US2025050417A1Processing system, processing method, computer program, recording medium, and control apparatusNIKON CORP·Filed 2024·Application pending·0 cites
- 1381US4704020AProjection optical apparatusNIPPON KOGAKU KK·Filed 1986·Granted Nov 3, 1987·32 cites·5 claims
- 1480US9958786B2Cleanup method for optics in immersion lithography using object on wafer holder in place of waferNIKON CORP·Filed 2014·Granted May 1, 2018·1 cites·35 claims
- 1577US4679942AMethod of aligning a semiconductor substrate and a photomaskNIPPON KOGAKU KK·Filed 1985·Granted Jul 14, 1987·27 cites·11 claims
- 1673US2018203366A1Cleanup method for optics in immersion lithographyNIKON CORP·Filed 2018·Application pending·0 cites
- 1772US12162070B2Processing system, processing method, computer program, recording medium, and control apparatusNIKON CORP·Filed 2019·Granted Dec 10, 2024·0 cites·56 claims
- 1872US6195155B1Scanning type exposure methodNIKON CORP·Filed 1999·Granted Feb 27, 2001·11 cites·27 claims
- 1963US5912727AProjection exposure method in which mask patterns are imaged on photosensitive substrates with adjustment of illumination and projection parameters corresponding to the mask patternNIKON CORP·Filed 1996·Granted Jun 15, 1999·19 cites·6 claims
- 2058US2007247601A1Cleanup method for optics in immersion lithographyNIKON CORP·Filed 2007·Application pending·0 cites
- 2158US2007171390A1Cleanup method for optics in immersion lithographyNIKON CORP·Filed 2007·Application pending·0 cites
- 2255US5671057AAlignment methodNIKON CORP·Filed 1996·Granted Sep 23, 1997·16 cites·3 claims
- 2355US5220176AApparatus and method for detecting alignment marks having alignment optical systems' driving meansNIKON CORP·Filed 1992·Granted Jun 15, 1993·12 cites·7 claims
- 2452US2022152751A1Processing system and processing methodNIKON CORP·Filed 2019·Application pending·0 cites
- 2549US6175405B1Projection exposure method and method of manufacturing a projection exposure apparatusNIKON CORP·Filed 1998·Granted Jan 16, 2001·9 cites·30 claims
- 2639US2005286050A1Real-time through lens image measurement system and methodNIKON CORP·Filed 2004·Application pending·0 cites
- 2736US2010136118A1Calcium absorption enhancerMATANO YUTAKA·Filed 2008·Application pending·0 cites
- 2833USRE38176EScanning exposure methodNIPPON KOGAKU KK·Filed 1999·Granted Jul 8, 2003·2 cites·32 claims
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